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Volumn 98, Issue 2, 2010, Pages 435-440
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Fast simulation code for heating, phase changes and dopant diffusion in silicon laser processing using the alternating direction explicit (ADE) method
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Author keywords
[No Author keywords available]
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Indexed keywords
ALTERNATING DIRECTIONS;
BASIC EQUATIONS;
COMPUTING TIME;
DOPANT DIFFUSION;
EVAPORATION MODEL;
EXPLICIT METHOD;
FAST SIMULATION;
FICK'S DIFFUSION;
FINITE DIFFERENCE;
IMPLICIT TIME INTEGRATION;
INTEGRATION METHOD;
KNUDSEN;
LASER DOPING;
MULTIPLE LASERS;
NONLINEAR TEMPERATURE;
NUMERICAL STABILITIES;
PHASE CHANGE;
PULSE LENGTH;
SIMULATION SPEED;
THREE DIMENSIONS;
ADVECTION;
CONVERGENCE OF NUMERICAL METHODS;
DIFFUSION;
DOPING (ADDITIVES);
ENTHALPY;
EVAPORATION;
HEATING;
LASER HEATING;
LASER PULSES;
LASERS;
NONLINEAR EQUATIONS;
SIMULATORS;
VAPORS;
PULSED LASER APPLICATIONS;
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EID: 72149126870
PISSN: 09478396
EISSN: 14320630
Source Type: Journal
DOI: 10.1007/s00339-009-5416-7 Document Type: Article |
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Times cited : (18)
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References (9)
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