A comparative study of TiN and TiC: Oxidation resistance and retention of xenon at high temperature and under degraded vacuum

Journal of Applied Physics

Volumn 109, Issue 1, 2011, Pages

  Gavarini, S ^a   Bes, R ^a   Millard Pinard, N ^a   Cardinal, S ^b   Peaucelle, C ^a   Perrat Mabilon, A ^a   Garnier, V ^b   Gaillard, C ^a  

^a UNIVERSITÉ LYON 1   (France)

^b UNIVERSITÉ DE LYON   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; CRYSTALLITES; FISSION PRODUCTS; HOT PRESSING; OXIDATION RESISTANCE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SPECTROMETRY; TIN; TITANIUM CARBIDE; TITANIUM DIOXIDE; TITANIUM NITRIDE; X RAY DIFFRACTION;

BACKSCATTERING SPECTROMETRY; COMPARATIVE STUDIES; FINE MICROSTRUCTURE; GRAZING INCIDENCE X-RAY DIFFRACTION; HIGH TEMPERATURE; OXIDE PHASIS; RETENTION PROPERTIES; RUTHERFORD BACK-SCATTERING SPECTROMETRY;

TIN OXIDES;

EID: 78751498960     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3524267     Document Type: Article

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