Measurement of properties of copper telluride thin films using holography

Progress In Electromagnetics Research C

Volumn 12, Issue , 2010, Pages 53-64

  Fulari, V J ^a   Malekar, V P ^a   Gangawane, S A ^a  

^a SHIVAJI UNIVERSITY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITED FILMS; DEPOSITION TIME; DOUBLE EXPOSURE HOLOGRAPHIC INTERFEROMETRIES; ELECTRODEPOSITION TECHNIQUE; FRINGE PATTERN; OPTICAL ABSORPTION; SURFACE WETTABILITY; THREE DIMENSIONAL IMAGES;

ANGLE MEASUREMENT; CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; DEPOSITION; ELECTROMAGNETIC WAVES; FILM THICKNESS; IMAGE ENHANCEMENT; OPTICAL PROPERTIES; THIN FILMS; THREE DIMENSIONAL; X RAY DIFFRACTION;

HOLOGRAPHIC INTERFEROMETRY;

EID: 78651577429     PISSN: 19378718     EISSN: 15309681     Source Type: Journal    
DOI: 10.2528/PIERC09103002     Document Type: Article

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