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Journal of Alloys and Compounds

Volumn 509, Issue 5, 2011, Pages 1418-1423

Physical properties of chemical vapour deposited nanostructured carbon thin films

(4) Mahadik, D B a Shinde, S S a Bhosale, C H a Rajpure, K Y a

a SHIVAJI UNIVERSITY (India)

Author keywords

Carbon films; Chemical vapour deposition; Contact angle; FTIR; Raman; SEM; XRD

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; FTIR; RAMAN; SEM; XRD;

ANGLE MEASUREMENT; CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; FOURIER TRANSFORMS; QUARTZ; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; STAINLESS STEEL; STRETCHING; SUBSTRATES; X RAY DIFFRACTION;

CARBON FILMS;

EID: 78651379110 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2010.11.021 Document Type: Article

Times cited : (14)

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