Plasma/thermal-driven the rapid wettability transition on a copper surface

Applied Surface Science

Volumn 257, Issue 8, 2011, Pages 3753-3757

  Zhu, Xiaotao ^a,b   Zhang, Zhaozhu ^a   Men, Xuehu ^a   Yang, Jin ^a,b   Xu, Xianghui ^a,b   Zhou, Xiaoyan ^a,b  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Copper; Plasma treatment; Superhydrophobic surface; Wettability transition

Indexed keywords

ACTIVATION ANALYSIS; ANNEALING; COPPER; HYDROPHILICITY; HYDROPHOBICITY; PLASMA APPLICATIONS; SURFACE PROPERTIES;

AIR-PLASMA TREATMENT; ANNEALING PROCESS; PLASMA TREATMENT; SHORTEST PROCESSING TIME; SUPER-HYDROPHILICITY; SUPER-HYDROPHOBIC SURFACES; SUPERHYDROPHOBICITY; SURFACE WETTABILITY;

WETTING;

EID: 78651372334     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.11.132     Document Type: Article

References (26)

1. F. Shi, Y. Song, J. Niu, X. Xia, Z. Wang, and X. Zhang Chem. Mater. 18 2006 1365 1368
2. T.P. Russell Science 297 2002 964 967
3. C. Feng, Y. Zhang, J. Jin, Y. Song, L. Xie, G. Qu, L. Jiang, and D.B. Zhu Langmuir 17 2001 4593 4597
4. G.Y. Qing, X. Wang, H. Fuchs, and T.L. Sun J. Am. Chem. Soc. 131 2009 8370 8371
5. H.S. Lim, J.T. Han, D. Kwak, M.H. Jin, and K. Cho J. Am. Chem. Soc. 128 2006 14458 14459
6. Q. Fu, G.V.R. Rao, S.B. Basame, D.J. Keller, K. Artyushkova, J.E. Fulghum, and G.P. Lopez J. Am. Chem. Soc. 126 2004 8904 8905
7. L. Ionov, S. Minko, M. Stamm, J.F. Gohy, R. Jerome, and A. Scholl J. Am. Chem. Soc. 125 2003 8302 8306
8. Y.L. Wang, and B. Bhushan Langmuir 26 2010 4013 4017
9. J.R. Matthews, D. Tuncel, R.M.J. Jacobs, C.D. Bain, and H.L. Anderson J. Am. Chem. Soc. 125 2003 6428 6433
10. G. Caputo, B. Cortese, C. Nobile, M. Salerno, R. Cingolani, G. Gigli, P.D. Cozzoli, and A. Athanassiou Adv. Funct. Mater. 19 2009 1149 1157
11. W.L. Song, F. Xia, Y.B. Bai, F.Q. Liu, T.L. Sun, and L. Jiang Langmuir 23 2007 327 331
12. W.Q. Zhu, J. Zhai, Z.W. Sun, and L. Jiang J. Phys. Chem. C 112 2008 8338 8342
13. M. Im, D.H. Kim, J.H. Lee, J.B. Yoon, and Y.K. Choi Langmuir 26 2010 12443 12447
14. E. Stratakis, A. Mateescu, M. Barberoglou, M. Vamvakaki, C. Fotakis, and S.H. Anastasiadis Chem. Commun. 46 2010 4136 4138
15. G.B. Gomez, L.M. Flendrig, and J.M. Cooper Langmuir 26 2010 7248 7253
16. J. Wu, H.J. Bai, X.B. Zhang, J.J. Xu, and H.Y. Chen Langmuir 26 2010 1191 1198
17. Y.F. Zhang, X.Q. Yu, Q.H. Zhou, F. Chen, and K.N. Li Appl. Surf. Sci. 256 2010 1883 1887
18. X. Zhang, Y.G. Guo, P.Y. Zhang, Z.S. Wu, and Z.J. Zhang Mater. Chem. Phys. 123 2010 309 313
19. J.P. Liu, X.T. Huang, Y.Y. Li, Z.K. Li, Q.B. Chi, and G.Y. Li Solid. State. Sci. 10 2008 1568 1576
20. W.X. Zhang, X.G. Wen, S.H. Yang, Y. Berta, and Z.L. Wang Adv. Mater. 15 2003 822 824
21. X.G. Wen, W.X. Zhang, and S.H. Yang Langmuir 19 2003 5898 5903
22. W.Q. Zhu, X.J. Feng, L. Feng, and L. Jiang Chem. Commun. 26 2006 2753 2755
23. T. Xu, S.R. Yang, J.J. Lv, Q.J. Xue, J.Q. Li, W.T. Guo, and Y.Y. Sun Diamond. Relat. Mater. 10 2001 1441 1447
24. J.A. Chai, F.Z. Lu, B.M. Li, and D.Y. Kwok Langmuir 20 2004 10919 10927
25. K. Tsougeni, D. Papageorgiou, A. Tserepi, and E. Gogolides Lab Chip. 10 2010 462 469
26. D. Bodas, and C. Khan-Malek Sens. Actuators B 123 2007 368 373