Application of 80-200 kV aberration corrected dedicated STEM with cold FEG

Journal of Physics: Conference Series

Volumn 241, Issue , 2010, Pages

  Konno, M ^a   Suzuki, Y ^a   Inada, H ^b   Nakamura, K ^b  

^a Naka Division   (Japan)

^b Nanotechnology Products Business Group   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; FIELD EMISSION; TRANSMISSION ELECTRON MICROSCOPY;

ABERRATION CORRECTORS; ABERRATION-CORRECTED; ACCELERATING VOLTAGES; ANALYTICAL TRANSMISSION ELECTRON MICROSCOPE; COLD FIELD EMISSIONS; HIGH CURRENT DENSITIES; LOW ACCELERATING VOLTAGE; STRUCTURAL CHARACTERIZATION;

DIGITAL TELEVISION;

EID: 78651104136     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/241/1/012011     Document Type: Conference Paper

References (6)

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3. Nakamura K, Konno M, Yaguchi T, Kamino T, Terauchi D, Inada H, Tanaka H, Taniguchi Y and Isakozawa S 2006 proc. 16th Int. Microscopy Congress p 633
4. Inada H, Zhu Y, Wall J, Volkov V, Nakamura K, Konno M, Jarausch K and Twesten D 2008 Microsc. Microanal. 14 1374
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