The newly installed aberration corrected and dedicated STEM (Hitachi HD2700C) at Brookhaven national laboratory

Microscopy and Microanalysis

Volumn 14, Issue SUPPL. 2, 2008, Pages 1374-1375

  Inada, H ^a   Zhu, Y ^b   Wall, J ^b   Volkov, V ^b   Nakamura, K ^c   Konno, M ^c   Jarausch, K ^a   Twesten, R D ^d  

^a Hitachi High Technologies America   (United States)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

^c HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

^d GATAN INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 49549102206     PISSN: 14319276     EISSN: 14358115     Source Type: Journal    
DOI: 10.1017/S1431927608084201     Document Type: Conference Paper

References (2)

1. th International Microscopy Congress, 2006, Sapporo, Japan, p.633.
2. Supported by US Department of Energy BES, under contract No. DE-AC02-98CH10886.