Atomistic mechanisms and diameter selection during nanorod growth

Journal of Physical Chemistry C

Volumn 115, Issue 1, 2011, Pages 31-36

  Shu, Da Jun ^a   Xiong, Xiang ^a   Wang, Zhao Wu ^a   Zhang, Zhenyu ^b,c   Wang, Mu ^a   Ming, Nai Ben ^a  

^a NANJING UNIVERSITY   (China)

^b UNIVERSITY OF TENNESSEE   (United States)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC MECHANISM; ATOMISTIC MECHANISM; CRITICAL SIZE; EHRLICH-SCHWOEBEL BARRIER; EXPERIMENTAL OBSERVATION; GROWTH CONDITIONS; GROWTH MODES; GROWTH MORPHOLOGY; HOPPING RATE; NANOROD GROWTH; NANOROD MORPHOLOGIES; SCREENING EFFECT; THEORETICAL PREDICTION; TRANSIENT LAYER; ZNO;

MONOLAYERS; MORPHOLOGY; ZINC OXIDE;

NANORODS;

EID: 78651094978     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp1060528     Document Type: Article

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