Selective fabrication of Cu/Cu2O nanowires using porous alumina membranes in acidic solution

Solid State Sciences

Volumn 13, Issue 1, 2011, Pages 280-284

  Wang, Xuehua ^a   Li, Chengyong ^a   Chen, Gui ^a   He, Lei ^a   Cao, Hong ^a   Zhang, Baohua ^a  

^a WUHAN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Alternating current electrochemical deposition; Anodic aluminum oxide; Cu nanowires; Cu2O nanowires; Porous alumina membrane; X ray diffraction

Indexed keywords

ANODIC ALUMINUM OXIDE; CU NANOWIRES; CU2O NANOWIRES; ELECTROCHEMICAL DEPOSITION; POROUS ALUMINA MEMBRANES;

ALUMINUM; ALUMINUM COATINGS; DIFFRACTION; ELECTRODEPOSITION; ELECTROLYTES; FIELD EMISSION; FIELD EMISSION MICROSCOPES; OXIDES; PH; REDUCTION; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAYS;

NANOWIRES;

EID: 78650603432     PISSN: 12932558     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solidstatesciences.2010.11.005     Document Type: Article

References (29)

1. T.M. Whitney, P.C. Searson, J.S. Jiang, and C.L. Chien Science 261 1993 1316
2. H.Q. Cao, C.Y. Tie, and Z. Xu Appl. Phys. Lett. 78 2001 1592
3. H.Q. Cao, Z. Xu, H. Sang, D. Sheng, and C.Y. Tie Adv. Mater. 13 2001 121
4. J.T. Hu, M. Ouyang, P.D. Yang, and C.M. Lieber Nature 399 1999 48
5. Z.L. Wang, and J.H. Song Science 312 2006 242
6. M.S. Gudiksen, L.J. Lauhon, J.F. Wang, D.C. Smith, and C.M. Lieber Nature 415 2002 617
7. X.F. Duan, Y. Huang, R. Agarwal, and C.M. Lieber Nature 421 2003 241
8. P.D. Yang, H.Q. Yan, S. Mao, R. Russo, J. Johnson, R. Saykally, N. Morris, J. Pham, R. He, and H.J. Choi Adv. Funct. Mater. 5 2002 323
9. S. Bhattacharya, D. Banerjee, K.W. Adu, S. Samui, and S. Bhattacharyya Appl. Phys. Lett. 85 2004 2008
10. G. Schider, J.R. Krenn, W. Gotschy, B. Lamprecht, H. Ditlbacher, A. Leitner, and F.R. Aussenegg J. Appl. Phys. 90 2001 3825
11. M.E. Toimil Molaresa, E.M. Höhberger, C. Schaeflein, R.H. Blick, R. Neumann, and C. Trautmann Appl. Phys. Lett. 82 2003 2139
12. W. Steinhögl, G. Schindler, G. Steinlesberger, M. Traving, and M. Engelhardt J. Appl. Phys. 97 2005 23706 23711
13. H. Choi, and S.H. Park J. Am. Chem. Soc. 126 2004 6248
14. M.E.T. Molares, V. Buschmann, D. Dobrev, R. Neumann, R. Scholz, I.U. Schuchert, and J. Vetter Adv. Mater. 13 2001 62
15. R.J. Philips, M.J. Shane, and J.A. Switzer J. Mater. Res. 4 1989 923
16. J.A. Switzer, R. Liu, E.W. Bohannan, and F. Ernst J. Phys. Chem. B 106 2002 12369
17. T. Mahalingam, J.S.P. Chitra, S. Rajendran, M. Jayachandran, and M.J. Chockalingam J. Cryst. Growth 216 2000 304
18. E.D. Mishina, K. Nagai, and S. Nakabayashi Nano Lett. 1 2001 401
19. B. Beverskog, and I. Puigdomenech J. Electrochem. Soc. 144 1997 3476
20. J.A. Switzer, C.J. Hung, L.Y. Huang, F. Scott Miller, Y.C. Zhou, E.R. Raub, M.G. Shumsky, and E.W. Bohannan J. Mater. Res. 13 1998 909
21. A.L. Daltina, A. Addadb, and J.P. Chopart J. Cryst. Growth 282 2005 414
22. Y.H. Lee, I.C. Leub, M.T. Wu, J.H. Yen, and K.Z. Fung J. Alloys Compd. 427 2007 213
23. A. Takai, Y. Yamauchi, and K. Kuroda Chem. Commun. 35 2008 4171
24. Y. Yamauchi, A. Takai, T. Nagaura, S. Inoue, and K. Kuroda J. Am. Chem. Soc. 130 2008 5426
25. A. Takai, T. Saida, W. Sugimoto, L. Wang, Y. Yamauchi, and K. Kuroda Chem. Mater. 21 2009 3414
26. H. Masuda, and K. Fukuda Science 268 1995 1466
27. H.S. Shin, J.Y. Song, and J. Yu Mater. Lett. 63 2009 397S
28. Leopold, M. Herranen, and J.O. Carisson J. Electrochem. Soc. 148 2001 C513
29. X.M. Liu, and Y.C. Zhou Appl. Phys. A 81 2005 685