An atomic-level study of material ablation and spallation in ultrafast laser processing of gold films

Journal of Applied Physics

Volumn 108, Issue 10, 2010, Pages

  Gan, Yong ^a   Chen, J K ^b  

^a ZHEJIANG UNIVERSITY   (China)

^b Department of Electrical Engineering and Computer Science   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LEVELS; FEMTOSECONDS; GOLD FILM; GOLD THIN FILMS; HOT-ELECTRON BLAST FORCE; LASER PROCESSING; MATERIAL ABLATION; MATERIAL REMOVAL RATE; MATERIAL STRENGTH; MOLECULAR DYNAMICS METHODS; NONTHERMAL; PICOSECOND LASER PULSE; SIMULATION RESULT; SIMULTANEOUS USE; TWO TEMPERATURE MODEL; ULTRA-SHORT LASER PULSE; ULTRAFAST LASER; ULTRAFAST LASER PROCESSING;

COMPUTER SIMULATION; LASER PULSES; MOLECULAR DYNAMICS; PULSE GENERATORS; SPALLING; TENSILE STRENGTH; ULTRAFAST LASERS; ULTRAFAST PHENOMENA; ULTRATHIN FILMS;

ABLATION;

EID: 78650274082     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3504192     Document Type: Conference Paper

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