Si quantum dot-sensitized solar cells using Si nanoparticles produced by plasma CVD

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2010, Pages 3347-3351

  Kawashima, Yuki ^a   Yamamoto, Kousuke ^a   Sato, Muneharu ^a   Nakahara, Kenta ^a   Matsunaga, Takeaki ^a   Nakamura, William Makoto ^a   Yamashita, Daisuke ^a   Matsuzaki, Hidefumi ^a   Uchida, Giichiro ^a   Kamataki, Kunihiro ^a   Itagaki, Naho ^a   Koga, Kazunori ^a   Shiratani, Masaharu ^a   Kondo, Michio ^b  

^a KYUSHU UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASSEMBLING METHOD; BAND GAP ENERGY; CARRIER GENERATION; CONVENTIONAL METHODS; ELECTRONS AND HOLES; LIGHT INTENSITY; NOVEL METHODS; PHOTON ENERGY; PHOTON-TO-CURRENT CONVERSION EFFICIENCY; PLASMA-CVD; SI NANOPARTICLES; SI QUANTUM DOT; TIO; WAVELENGTH RANGES;

CONVERSION EFFICIENCY; NANOPARTICLES; PHOTONS; PHOTOVOLTAIC EFFECTS; SEMICONDUCTOR QUANTUM DOTS; SILICON; SOLAR CELLS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 78650087170     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2010.5617205     Document Type: Conference Paper

References (22)

1. W. Shockley, H. J. Queisser, J. Appl. Phys., 32 (1961) 510.
2. M.C. Hanna and A. J. Nozik, J. Appl. Phys., 100 (2006) 074510.
3. A.J. Nozik, Ann. Rev. Phys. Chem., 52 (2001) 193.
4. A.J. Nozik, Physica E, 14 (2002)115.
5. R.D. Schaller and V.I. Klimov, Phys. Rev. Lett., 92(2004) 186601.
6. R. J. Ellingson, M. C. Beard, J. C. Johnson, P. Yu, O.I. Micic, A. J. Nozik, and A. L. Efros, Nano Lett., 5 (2005) 865-871.
7. J.E. Murphy, M.C. Beard, A.G. Norman, S.P. Ahrenkiel, J. C. Johnson, P. Yu, O.I. Micic, R.J. Ellingson, and A.J. Nozik, J. Am. Chem. Soc. 128 (2006) 3241.
8. R.D. Schaller, M.A. Petruska, and V.I. Klimov, Appl. Phys. Lett., 87(2005) 253102.
9. R.D. Schaller, M. Sykora, J.M. Pietryga, and V.I. Klimov, Nano Lett., 6(2006) 424.
10. J.J.H. Pijpers, E. Hendry, M.T.W. Milder, R. Fanciulli, J. Savolainen, J.L. Herek, D. Vanmaekelbergh, S. Ruhman, D. Mocata, D. Oron, A. Aharoni, U. Banin and M. Bpnn, J. Phys. Chem. C 111(2007) 4146.
11. M. C. Beard, K. P. Knutsen, P. Yu, J. M. Luther, Q. Song, W. K. Metzger, R. J. Ellingson, and A. J. Nozik, Nano Lett., 7 (2007) 2506.
12. S. J. Kim, W. J. Kim, Y. Sahoo, A. N. Cartwright, and P. N. Prasad, Appl. Phys. Lett., 92 (2008) 031107.
13. D. Liu, P.V. Kamat, J. Phys. Chem., 97(1993) 10769.
14. R. Vogel and H. Weller, J. Phys. Chem., 98(1994) 3183.
15. P. Hoyer, R. Konenkamp, Appl. Phys. Lett., 66(1995) 349.
16. A. Zaban, O.I. Micic, B.A. Gregg, and A.J. Nozik, Langmuir, 14 (1998) 3153.
17. I. Robel, V. Subramanian, M. Kuno, P.V. Kamat, J. Am. Chem. Soc., 128 (2006) 2385.
18. S.C. Lin, Y. L. Lee, C. H. Chang, Y. J. Shen, and Y. M. Yang, Appl. Phys. Lett., 90 (2007) 143517.
19. P. Yu, K. Zhu, A. G. Norman, S. Ferrere, A. J. Frank, and A. J. Nozik, J. Phys. Chem. B, 110 (2006) 25451.
20. T. Kakeya, K. Koga, M. Shiratani, Y. Watanabe, M. Kondo, Thin Solid Films, 506-507 (2006) 288.
21. M. Shiratani, K. Koga, S. Ando, T. Inoue, Y. Watanabe, S. Nunomura, M. Kondo, Surf. Coat. Technol. 201 (2007) 5468.
22. C. Delerue, G. Allan, and M. Lannoo, Phys. Rev. B 48 (1993) 11024.