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Volumn 125, Issue 3, 2011, Pages 485-492

Effects of LP-MOCVD prepared TiO2 thin films on the in vitro behavior of gingival fibroblasts

Author keywords

Biomaterials; Chemical vapor deposition; Fibroblast cell culture; TiO2

Indexed keywords

CELL BEHAVIORS; CELL LINES; CELL VIABILITY; EXTRACELLULAR MATRICES; FIBROBLAST CELL CULTURE; HUMAN GINGIVAL FIBROBLASTS; IMMUNOSTAINING; IMPLANTOLOGY; IN-VITRO; LOW PRESSURES; LP-MOCVD; MATRIX METALLOPROTEINASES; METALORGANIC CHEMICAL VAPOR DEPOSITION; MOCVD; STRUCTURAL PARAMETER; TI SUBSTRATES; TIO; TITANIUM SURFACES;

EID: 78650034157     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2010.10.028     Document Type: Article
Times cited : (15)

References (46)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.