Design and fabrication of an 8-channel and 1.6 nm arrayed waveguide grating based on Si nanowires

Guangdianzi Jiguang/Journal of Optoelectronics Laser

Volumn 21, Issue 11, 2010, Pages 1589-1592

  Zhao, Lei ^a   An, Jun Ming ^a   Zhang, Jia Shun ^a   Song, Shi Jiao ^a   Wu, Yuan Da ^a   Hu, Xiong Wei ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

Arrayed waveguide grating(AWG); Electron beam lithography(EBL); Inductively coupled plasma(ICP) etching; Si nanowire waveguide

Indexed keywords

CENTRAL CHANNELS; CHANNEL SPACINGS; DEMULTIPLEXERS; EFFECTIVE AREA; ELECTRON BEAM LITHOGRAPHY(EBL); FABRICATION PROCEDURE; FUNCTION METHODS; INDUCTIVELY COUPLED PLASMA(ICP) ETCHING; SI NANOWIRE; SI NANOWIRE WAVEGUIDE; ULTRA-SMALL;

CROSSTALK; DEMULTIPLEXING; ELECTROMAGNETIC INDUCTION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON OPTICS; ETCHING; INDUCTIVELY COUPLED PLASMA; NANOWIRES; OPTICAL WAVEGUIDES; SILICON; WAVEGUIDES;

ARRAYED WAVEGUIDE GRATINGS;

EID: 78649990017     PISSN: 10050086     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

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