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Volumn , Issue , 2010, Pages 226-229

Analysis and modeling of pseudo-short-channel effects in ZnO-nanoparticle thin-film transistors

Author keywords

[No Author keywords available]

Indexed keywords

ANALYSIS AND MODELING; ANALYTICAL MODEL; CIRCUIT DESIGNS; COMPLEX NATURE; DEVICE PHYSICS; EXPERIMENTAL DATA; MOS-FET; SATURATION REGION; SEMI-EMPIRICAL PARAMETERS; SHORT-CHANNEL EFFECT; TRANSISTOR CHARACTERISTICS; ZNO;

EID: 78649980450     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDERC.2010.5618383     Document Type: Conference Paper
Times cited : (9)

References (10)
  • 1
    • 55849103534 scopus 로고    scopus 로고
    • Solutionprocessed ZnO nanoparticle-based semiconductor oxide thin-film transistors
    • S. Lee, Y. Jeong, S. Jeong, J. Lee, M. Jeon, and J. Moon, "Solutionprocessed ZnO nanoparticle-based semiconductor oxide thin-film transistors, " Superlattices and Microstructures, vol. 44, no. 6, pp. 761-769, 2008.
    • (2008) Superlattices and Microstructures , vol.44 , Issue.6 , pp. 761-769
    • Lee, S.1    Jeong, Y.2    Jeong, S.3    Lee, J.4    Jeon, M.5    Moon, J.6
  • 3
    • 69249142820 scopus 로고    scopus 로고
    • Low-temperature solution-processed memory transistors based on zinc oxide nanoparticles
    • H. Faber, M. Burkhardt, A. Jedaa, D. Kälblein, H. Klauk, and M. Halik, "Low-Temperature Solution-Processed Memory Transistors Based on Zinc Oxide Nanoparticles, " Advanced Materials, vol. 21, no. 30, pp. 3099-3104, 2009.
    • (2009) Advanced Materials , vol.21 , Issue.30 , pp. 3099-3104
    • Faber, H.1    Burkhardt, M.2    Jedaa, A.3    Kälblein, D.4    Klauk, H.5    Halik, M.6
  • 4
    • 51349139857 scopus 로고    scopus 로고
    • Influence of interface roughness on the performance of nanoparticulate zinc oxide field-effect transistors
    • K. Okamura, N. Mechau, D. Nikolova, and H. Hahn, "Influence of interface roughness on the performance of nanoparticulate zinc oxide field-effect transistors, " Appl. Phys. Lett., vol. 93, no. 8, pp. 083 105-1 - 3, 2008.
    • (2008) Appl. Phys. Lett. , vol.93 , Issue.8 , pp. 0831051-0831053
    • Okamura, K.1    Mechau, N.2    Nikolova, D.3    Hahn, H.4
  • 6
    • 36449006867 scopus 로고
    • Silicon field-effect transistor based on quantum tunneling
    • R. J. Tucker, C. Wang, and S. P. Carney, "Silicon field-effect transistor based on quantum tunneling, " Appl. Phys. Lett., vol. 65, no. 5, pp. 618- 620, 1994.
    • (1994) Appl. Phys. Lett. , vol.65 , Issue.5 , pp. 618-620
    • Tucker, R.J.1    Wang, C.2    Carney, S.P.3
  • 7
    • 72849149824 scopus 로고    scopus 로고
    • Degussa AG (Advanced Nanomaterials), "Datasheet "AdNano Zinc Oxide", " www.advancednanomaterials.com, 2006.
    • (2006) Datasheet "AdNano Zinc Oxide
  • 8
    • 67349177817 scopus 로고    scopus 로고
    • Characterization of ZnO nanoparticle suspension in water: Effectiveness of ultrasonic dispersion
    • J. S. Chung, P. J. Leonard, I. Nettleship, K. J. Lee, Y. Soong, V. D. Martello, and K. M. Chyu, "Characterization of ZnO nanoparticle suspension in water: Effectiveness of ultrasonic dispersion, " Powder Technology, vol. 194, no. 1-2, pp. 75-80, 2009.
    • (2009) Powder Technology , vol.194 , Issue.1-2 , pp. 75-80
    • Chung, J.S.1    Leonard, P.J.2    Nettleship, I.3    Lee, K.J.4    Soong, Y.5    Martello, V.D.6    Chyu, K.M.7
  • 9
    • 29844436764 scopus 로고    scopus 로고
    • Contacts to ZnO: Proceedings of the international conference on materials for advanced technologies (ICMAT 2005) symposium N - ZnO and related materials
    • K. Ip, T. G. Thaler, H. Yang, S. Youn Han, Y. Li, P. D. Norton, J. S. Pearton, S. Jang, and F. Ren, "Contacts to ZnO: Proceedings of the International Conference on Materials for Advanced Technologies (ICMAT 2005) Symposium N - ZnO and Related Materials, " Journal of Crystal Growth, vol. 287, no. 1, pp. 149-156, 2006.
    • (2006) Journal of Crystal Growth , vol.287 , Issue.1 , pp. 149-156
    • Ip, K.1    Thaler, T.G.2    Yang, H.3    Han, S.Y.4    Li, Y.5    Norton, P.D.6    Pearton, J.S.7    Jang, S.8    Ren, F.9
  • 10
    • 0020199664 scopus 로고
    • Mobility degradation due to the gate field in the inversion layer of MOSFET's
    • IEEE
    • Y. K. Fu, "Mobility degradation due to the gate field in the inversion layer of MOSFET's, " Electron Device Letters, IEEE, vol. 3, no. 10, pp. 292-293, 1982.
    • (1982) Electron Device Letters , vol.3 , Issue.10 , pp. 292-293
    • Fu, Y.K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.