Microplasmas: Scientific challenges & technological opportunities

European Physical Journal D

Volumn 60, Issue 3, 2010, Pages 437-439

  Becker, K H ^a   Kersten, H ^b   Hopwood, J ^c   Lopez, J L ^d  

^a POLYTECHNIC UNIVERSITY   (United States)

^b UNIVERSITY OF KIEL   (Germany)

^c Tufts University   (United States)

^d SAINT PETER'S UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICRO-PLASMAS; TECHNOLOGICAL OPPORTUNITY;

EID: 78649898925     PISSN: 14346060     EISSN: 14346079     Source Type: Journal    
DOI: 10.1140/epjd/e2010-00231-4     Document Type: Review

References (39)

1. M. Faraday, Experimental Researches in Electricity (Taylor and Francis, London, 1839), Vol. I
2. M. Faraday, Experimental Researches in Electricity (Taylor and Francis, London, 1844), Vol. II
3. M. Faraday, Experimental Researches in Electricity (Taylor and Francis, London, 1855), Vol. III
4. I. Langmuir 1926 Proceedings of the National Academy of Science 14 627 10.1073/pnas.14.8.627 1928PNAS...14..627L
5. L. Tonks I. Langmuir 1929 Phys. Rev. A 33 195 10.1103/PhysRev.33.195 1929PhRv...33..195T
6. C.T.R. Wilson 1901 Proc. Phys. Soc. London 68 151
7. J.S. Townsend H.E. Hurst 1904 Phil. Mag. 8 738
8. J.S. Townsend, Electricity in Gases (Clarendon Press, Oxford, 1915)
9. A. von Engel, Ionized Gases (Clarendon Press, Oxford,1955)
10. Y. Raizer, Gas Discharge Physics (Springer Verlag, Heidelberg, 1991)
11. M.A. Lieberman, A.J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (John Wiley, New York, 1994)
12. R. Hippler, H. Kersten, M. Schmidt, K.H. Schoenbach, Low Temperature Plasmas (Wiley-VCH, Weinheim, 2008)
13. Non-Equilibrium Air Plasmas at Atmospheric Pressure, Applications of Atmospheric-Pressure Air Plasmas, edited by K.H. Becker, U. Kogelschatz, K.H. Schoenbach, R. Barker (IOP Publ., Bristol, UK, 2004), Chap. 9
14. E.E. Kunhardt 2000 IEEE Trans. Plasma Sci. 28 1 10.1109/27.842901
15. K.H. Schoenbach R. Verhappen T. Tessnow P.F. Peterkin W. Byszewski 1996 Appl. Phys. Lett. 68 13 10.1063/1.116739 1996ApPhL..68...13S
16. J.W. Frame D.J. Wheeler T.A. DeTemple J.G. Eden 1997 Appl. Phys. Lett. 71 1165 10.1063/1.119614 1997ApPhL..71.1165F
17. R.M. Sankaran K.P. Giapis 2001 Appl. Phys. Lett. 79 593 10.1063/1.1388867 2001ApPhL..79..593S
18. C. Penache, A. Braeuning-Demian, L. Spielberger, H. Schmidt-Boecking, Proc. Hakone Vπ (Greifswald, Germany, 2000), Vol. 2, p. 501
19. K. Becker K.H. Schoenbach J.G. Eden 2006 J. Phys. D 39 R55 10.1088/0022-3727/39/3/R01 2006JPhD...39R..55B
20. J.W. Frame J.G. Eden 1998 Electron. Lett. 34 1529 10.1049/el:19981018
21. J.G. Eden S.-J. Park N.P. Ostrom S.T. McCain C.J. Wagner B.A. Vojak J. Chen C. Liu P. von Allmen F. Zenhausern D.J. Sadler J. Jensen D.L. Wilcox J.J. Ewing 2003 J. Phys. D 36 2869 10.1088/0022-3727/36/23/001 2003JPhD...36.2869E
22. W. Shi R.H. Stark K.H. Schoenbach 1999 IEEE Trans. Plasma Sci. 27 16 10.1109/27.763000 1999ITPS...27...16S
23. P. von Allmen D.J. Sadler C. Jensen N.P. Ostrom S.T. McCain B.A. Vojak J.G. Eden 2003 Appl. Phys. Lett. 82 4447 10.1063/1.1585137 2003ApPhL..82.4447V
24. P. von Allmen S.T. McCain N.P. Ostrom B.A. Vojak J.G. Eden F. Zenhausern C. Jensen M. Oliver 2003 Appl. Phys. Lett. 82 2562 10.1063/1.1565186 2003ApPhL..82.2562V
25. E.E. Kunhardt, K. Becker (1999) US Patent 5872426, and subsequent patents 6005349, 6147452, 6879103, and 6900592
26. A. Koutsospyros S.-M. Yin C. Christodoulatos K. Becker 2004 Int. J. Mass Spectrom. 233 305 10.1016/j.ijms.2003.12.033 2004IJMSp.233..305K
27. A. Koutsospyros S.M. Yin C. Christodoulatos K. Becker 2005 IEEE Trans. Plasma Sci. 33 42 10.1109/TPS.2004.841925 2005ITPS...33...42K
28. R. Foest M. Schmidt K. Becker 2005 Int. J. Mass Spectrom. 248 87
29. V. Karanassios 2004 Spectrochim. Acta B 59 909 10.1016/j.sab.2004.04.005 2004AcSpe..59..909K
30. J. Schäfer R. Foest A. Quade A. Ohl K.D. Weltmann 2009 Plasma Processes Polym. 6 S519 10.1002/ppap.200931103
31. G. Schaefer, K.H. Schoenbach, Basic Mechanisms Contributing to the Hollow Cathode Effect, in Physics and Applications of Pseudosparks, edited by M. Gundersen, G. Schaefer (Plenum Press, New York, 1990), p. 55
32. R.M. Sankaran K.P. Giapis 2002 J. Appl. Phys. 92 2406 10.1063/1.1497719 2002JAP....92.2406S
33. Z.Q. Yu K. Hoshimiya J.D. Williams S.F. Polvinen G.J. Collins 2003 Appl. Phys. Lett. 83 854 10.1063/1.1564640 2003ApPhL..83..854Y
34. B. Eliasson M. Hirth 1987 U. Kogelschatz. J. Phys. D 20 1421 10.1088/0022-3727/20/11/010 1987JPhD...20.1421E
35. M. Laroussi, in: Proc. IEEE Int. Conf. Plasma Sci. (ICOPS) (Monterey, CA, 1999), p. 203
36. J. Yan A. El-Dakrouri M. Laroussi M. Gupta 2002 J. Vac. Sci. Technol. B 20 2574 10.1116/1.1515302
37. N. Masoud K. Martus K. Becker 2004 Int. J. Mass Spectrom. 233 395 10.1016/j.ijms.2004.02.007 2004IJMSp.233..395M
38. N. Masoud K. Martus M. Figus K. Becker 2005 Contrib. Plasma Phys. 45 32 10.1002/ctpp.200510004 2005CoPP...45...32M
39. N. Masoud K. Martus K. Becker 2005 J. Phys. D 38 1674 10.1088/0022-3727/38/11/006 2005JPhD...38.1674M