Production of multiply charged Si and Fe ions from solid material in a 2.45 GHz electron cyclotron resonance source

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 2000, Pages 546-549

  Kato, Yushi ^a   Sugiyama, Saori ^a   Ishii, Shigeyuki ^a  

^a TOYAMA PREFECTURAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE STATE DISTRIBUTION; DC BIAS VOLTAGE; ECR PLASMA; ENDPLATES; EXPERIMENTAL CONDITIONS; FE-IONS; ION CURRENTS; MICROWAVE POWER; MIRROR FIELD; MULTI-CHARGED ION; MULTIPLY CHARGED IONS; OPERATING PARAMETERS; SI IONS; SOLID MATERIAL; TARGET POSITION;

BIAS VOLTAGE; CYCLOTRONS; ION IMPLANTATION; ION SOURCES; IRON COMPOUNDS; ISOMERS; MAGNETIC FIELDS; MAGNETIC MIRRORS; MIRRORS; RESONANCE; SILICON;

ELECTRON CYCLOTRON RESONANCE;

EID: 78649882720     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/.2000.924210     Document Type: Conference Paper

References (4)

1. Y. Kato and S. Ishii, "Sputtering-Assisted Production of Multicharged Boron Ions from Solid Material in a 2.45 GHz Electron Cyclotron Resonance Source," Rev. Sci. Instrum, vol.67, pp. 2171-2175, June, 1996.
2. Y. Kato, S. Kobayashi and S. Ishii, "Enhanced Production of Multi-Charged Ions Using pulse-modulated microwave in a 2.45 GHz Electron Cyclotron Resonance Source," Rev. Sci. Instrum, vol.71, pp. 657-659, February, 2000.
3. Y. Kato and S. Ishii, "Production of Multicharged Ions and Resonance-Surface Configurations of a 2.45 GHz Electron Cyclotron Resonance Source," Int. Cong. On Plasma Phys., Québec, Oct. 23-27,2000.
4. N. Matsunami, et.al., "Energy Dependence of the Yields of Ion-Induced Sputtering of Monatomic Solids," Institute of Plasma Physics, Nagoya Univ., IPPJ-AM-32, p.42, 1983