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Volumn 92, Issue 6, 2010, Pages 379-382

Resonance Microwave Photoresistance of a Two-Subband Electron System at Large Filling Factors

(3) Bykov, A A a Mozulev, E G b Kalagin, A K a

a INSTITUTE OF SEMICONDUCTOR PHYSICS (Russian Federation)

b NOVOSIBIRSK STATE UNIVERSITY (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 78649780384 PISSN: 00213640 EISSN: 10906487 Source Type: Journal
DOI: 10.1134/S0021364010180049 Document Type: Article

Times cited : (5)

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