Study on resist sensitivities for nano-scale imaging using water window X-ray microscopy

Radiation Physics and Chemistry

Volumn 80, Issue 2, 2011, Pages 248-252

  Gowa, Tomoko ^a   Takahashi, Tomohiro ^a   Oshima, Akihiro ^b   Tagawa, Seiichi ^a,b   Washio, Masakazu ^a  

^a WASEDA UNIVERSITY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

K L edge absorption; Resists; Soft X rays; Water window region; X ray microscopy

Indexed keywords

K/L-EDGE ABSORPTION; RESISTS; SOFT X-RAY; WATER WINDOW REGION; X RAY MICROSCOPY;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; NANOSTRUCTURED MATERIALS; OXYGEN; WATER ABSORPTION; X RAY MICROSCOPES;

X RAYS;

CARBON; CHLORINE; OXYGEN; POLY(METHYL METHACRYLATE); RESIN;

ABSORPTION; ARTICLE; CONTROLLED STUDY; ELECTRON BEAM; ENERGY RESOURCE; IMAGE ANALYSIS; LIGHT; NANOANALYSIS; NANOIMAGING; RADIATION DOSE; SENSITIVITY ANALYSIS; X IRRADIATION; X RAY ANALYSIS;

EID: 78649335395     PISSN: 0969806X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.radphyschem.2010.07.041     Document Type: Article

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