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Volumn 356, Issue 44-49, 2010, Pages 2468-2472

Study of Cu+, Ag+ and Au+ ion implantation into silicate glasses

(9) Svecova, B a Nekvindova, P a MacKova, A b,c Malinsky, P b,c Kolitsch, A d MacHovic, V a Stara, S a Mika, M a Spirkova, J a

a INSTITUTE OF CHEMICAL TECHNOLOGY (Czech Republic)

b NUCLEAR PHYSICS INSTITUTE (Czech Republic)

c J E PURKINJE UNIVERSITY (Czech Republic)

d INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH (Germany)

Author keywords

Ion implantation; Metal nanoparticles; Rutherford backscattering; Silicate glasses

Indexed keywords

ANALYTICAL METHOD; CONCENTRATION-DEPTH PROFILE; GLASS MATRICES; GLASS NETWORK; GLASS NETWORK FORMER; GLASS STRUCTURE; GLASS SUBSTRATES; IMPLANTATION FLUENCE; IMPLANTED IONS; IMPLANTED SAMPLES; METAL NANOPARTICLES; PHOTONICS APPLICATIONS; PROJECTED RANGE; RUTHERFORD BACK-SCATTERING; RUTHERFORD BACK-SCATTERING SPECTROMETRY; SILICATE GLASS; SILICATE GLASSES; STRUCTURAL CHANGE; UV-VIS ABSORPTION SPECTROSCOPY;

ATOMIC SPECTROSCOPY; BACKSCATTERING; CRYSTAL ATOMIC STRUCTURE; GLASS; ION IMPLANTATION; NANOPARTICLES; OPTICAL PROPERTIES; RAMAN SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICATES; SUBSTRATES; ULTRAVIOLET SPECTROSCOPY;

ABSORPTION SPECTROSCOPY;

EID: 78349305140 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2010.03.031 Document Type: Conference Paper

Times cited : (22)

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