|
Volumn 191, Issue 1-4, 2002, Pages 416-421
|
Nano-cluster engineering: A combined ion implantation/co-deposition and ionizing radiation
|
Author keywords
[No Author keywords available]
|
Indexed keywords
DEPOSITION;
ION BEAMS;
ION IMPLANTATION;
IONIZING RADIATION;
NUCLEATION;
SILICA;
SUBSTRATES;
THIN FILMS;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION ANALYSIS;
NANOCLUSTERS;
NANOSTRUCTURED MATERIALS;
|
EID: 0036574366
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(02)00584-0 Document Type: Article |
Times cited : (25)
|
References (13)
|