Microstructure of high-energy O and Cu ion-implanted silica glasses

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 175-177, Issue , 2001, Pages 202-207

  Nakao, S ^a   Wang, S X ^b   Wang, L M ^b   Ikeyama, M ^a   Miyagawa, Y ^a   Miyagawa, S ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b UNIVERSITY OF MICHIGAN   (United States)

Author keywords

Copper ion; Ion implantation; Nanoparticle; Oxygen ion; Silica glass; Transmission electron microscopy

Indexed keywords

ANNEALING; COPPER; CRYSTAL MICROSTRUCTURE; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; OXYGEN; SINGLE CRYSTALS; TRANSMISSION ELECTRON MICROSCOPY;

BURIED LAYERS;

FUSED SILICA;

EID: 0035302753     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(00)00670-4     Document Type: Conference Paper

References (6)