Methods for controlling the pore properties of ultra-thin nanocrystalline silicon membranes

Journal of Physics Condensed Matter

Volumn 22, Issue 45, 2010, Pages

  Fang, D Z ^a   Striemer, C C ^a,b   Gaborski, T R ^b   McGrath, J L ^a   Fauchet, P M ^a  

^a University of Rochester   (United States)

^b SiMPore Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON IMAGING; MASS TRANSPORT; MOLECULAR SEPARATION; NANOPORE FORMATION; PORE PROPERTY; RAPID THERMAL TREATMENT; THERMAL TREATMENT; THIN-FILM DEPOSITIONS; ULTRA-THIN; ULTRA-THIN MEMBRANES;

DEPOSITION; HEAT TREATMENT; MEMBRANES; NANOPORES; POROUS SILICON; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS;

NANOCRYSTALLINE SILICON;

NANOMATERIAL; SILICON;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; CRYSTALLIZATION; MATERIALS TESTING; METHODOLOGY; PARTICLE SIZE; POROSITY; ULTRASTRUCTURE;

CRYSTALLIZATION; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; NANOSTRUCTURES; PARTICLE SIZE; POROSITY; SILICON;

EID: 78149451807     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/22/45/454134     Document Type: Article

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