Nonlinear characteristics of the Fowler-Nordheim plots of carbon nanotube field emission

Physica Scripta

Volumn 82, Issue 3, 2010, Pages

  Chen, Lei Feng ^a   Ji, Zhen Guo ^a,b   Mi, Yu Hong ^a   Ni, Hua Liang ^a   Zhao, Hai Feng ^c  

^a HANGZHOU DIANZI UNIVERSITY   (China)

^b ZHEJIANG UNIVERSITY   (China)

^c CHANGCHUN INSTITUTE OF OPTICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED VOLTAGES; CARBON NANOTUBE FILMS; CONTACT BARRIER; CRITICAL VOLTAGES; CURRENT SATURATION; FIELD EMITTER; FN PLOTS; FOWLER-NORDHEIM PLOTS; HIGH-VOLTAGES; NON-LINEARITY; NONLINEAR CHARACTERISTICS; SI SUBSTRATES; SILICON SUBSTRATES; THERMAL CHEMICAL VAPOR DEPOSITION; TURN ON VOLTAGE;

CARBON FILMS; CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; CIRCUIT THEORY; FIELD EMISSION; SILICON COMPOUNDS; SILICON OXIDES; SUBSTRATES;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 78149437169     PISSN: 00318949     EISSN: 14024896     Source Type: Journal    
DOI: 10.1088/0031-8949/82/03/035602     Document Type: Article

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