Enhanced field emission properties of vertically aligned double-walled carbon nanotube arrays

Nanotechnology

Volumn 19, Issue 41, 2008, Pages

  Chen, Guohai ^a   Shin, Dong Hoon ^a   Iwasaki, Takayuki ^b   Kawarada, Hiroshi ^b   Lee, Cheol Jin ^a  

^a Korea University   (South Korea)

^b WASEDA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FIELD EMISSION; MICROWAVES; MULTIWALLED CARBON NANOTUBES (MWCN); NANOCOMPOSITES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NANOTUBES; PLASMA DEPOSITION; SILICON; SILICON COMPOUNDS; SUBSTRATES;

CARBON NANOTUBE ARRAYS; EMISSION CURRENT DENSITIES; EMISSION PERFORMANCES; ENHANCED FIELD EMISSIONS; FIELD EMISSION PROPERTIES; INTERLAYER SPACINGS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITIONS; SI SUBSTRATES; THRESHOLD FIELDS; TUBE DIAMETERS; VERTICAL ALIGNMENTS; VERTICALLY ALIGNED;

CARBON NANOTUBES;

CHROMIUM; DOUBLE WALLED NANOTUBE; SILICON DIOXIDE;

ADHESION; ARTICLE; ELECTRIC CONDUCTIVITY; FIELD EMISSION; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 56349159592     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/41/415703     Document Type: Article

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