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Volumn 108, Issue 8, 2010, Pages

Enhanced high temperature thermoelectric properties of Bi-doped c -axis oriented Ca3 Co4 O9 thin films by pulsed laser deposition

(4) Sun, T a Hng, H H a Yan, Q Y a Ma, J a,b

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

BI-DOPED; C-AXIS ORIENTATIONS; ELECTRICAL PROPERTY; ELECTRICAL RESISTIVITY; ELEVATED TEMPERATURE; HIGH POWER FACTOR; HIGH TEMPERATURE THERMOELECTRIC PROPERTIES; IN-PLANE; STRUCTURAL CHARACTERIZATION; SURFACE CHEMICAL STATE; THERMOELECTRIC APPLICATION;

CALCIUM; CRYSTAL ORIENTATION; DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC POWER FACTOR; PULSED LASER DEPOSITION; PULSED LASERS; SINGLE CRYSTALS; THIN FILMS; VAPOR DEPOSITION;

COBALT;

EID: 78149425681 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3499324 Document Type: Article

Times cited : (43)

References (23)

1
- 2942645829
- PLRBAQ 0556-2805,. 10.1103/PhysRevB.56.R12685
- I. Terasaki, Y. Sasago, and K. Uchinokura, Phys. Rev. B PLRBAQ 0556-2805 56, R12685 (1997). 10.1103/PhysRevB.56.R12685
- (1997) Phys. Rev. B , vol.56 , pp. 12685
- Terasaki, I.¹ Sasago, Y.² Uchinokura, K.³

2
- 4344609908
- PLRBAQ 0556-2805,. 10.1103/PhysRevB.62.166
- A. C. Masset, C. Michel, A. Maignan, M. Hervieu, O. Toulemonde, F. Studer, B. Raveau, and J. Hejtmanek, Phys. Rev. B PLRBAQ 0556-2805 62, 166 (2000). 10.1103/PhysRevB.62.166
- (2000) Phys. Rev. B , vol.62 , pp. 166
- Masset, A.C.¹ Michel, C.² Maignan, A.³ Hervieu, M.⁴ Toulemonde, O.⁵ Studer, F.⁶ Raveau, B.⁷ Hejtmanek, J.⁸

3
- 0035898455
- APPLAB 0003-6951,. 10.1063/1.1385187
- R. Funahashi and I. Matsubara, Appl. Phys. Lett. APPLAB 0003-6951 79, 362 (2001). 10.1063/1.1385187
- (2001) Appl. Phys. Lett. , vol.79 , pp. 362
- Funahashi, R.¹ Matsubara, I.²

4
- 0037464247
- APPLAB 0003-6951,. 10.1063/1.1562337
- M. Shikano and R. Funahashi, Appl. Phys. Lett. APPLAB 0003-6951 82, 1851 (2003). 10.1063/1.1562337
- (2003) Appl. Phys. Lett. , vol.82 , pp. 1851
- Shikano, M.¹ Funahashi, R.²

5
- 67349125986
- JCOMEL 0953-8984,. 10.1088/0953-8984/19/35/356216
- Y. Wang, Y. Sui, J. G. Cheng, X. J. Wang, and W. H. Su, J. Phys.: Condens. Matter JCOMEL 0953-8984 19, 356216 (2007). 10.1088/0953-8984/19/35/ 356216
- (2007) J. Phys.: Condens. Matter , vol.19 , pp. 356216
- Wang, Y.¹ Sui, Y.² Cheng, J.G.³ Wang, X.J.⁴ Su, W.H.⁵

6
- 79956033369
- APPLAB 0003-6951,. 10.1063/1.1480115
- G. J. Xu, R. Funahashi, M. Shikano, I. Matsubara, and Y. Q. Zhou, Appl. Phys. Lett. APPLAB 0003-6951 80, 3760 (2002). 10.1063/1.1480115
- (2002) Appl. Phys. Lett. , vol.80 , pp. 3760
- Xu, G.J.¹ Funahashi, R.² Shikano, M.³ Matsubara, I.⁴ Zhou, Y.Q.⁵

7
- 33646881752
- JAPNDE 0021-4922,. 10.1143/JJAP.45.4131
- M. Mikami, K. Chong, Y. Miyazaki, T. Kajitani, T. Inoue, S. Sodeoka, and R. Funahashi, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 45, 4131 (2006). 10.1143/JJAP.45.4131
- (2006) Jpn. J. Appl. Phys., Part 1 , vol.45 , pp. 4131
- Mikami, M.¹ Chong, K.² Miyazaki, Y.³ Kajitani, T.⁴ Inoue, T.⁵ Sodeoka, S.⁶ Funahashi, R.⁷

8
- 33646855995
- JAPNDE 0021-4922,. 10.1143/JJAP.45.4152
- M. Mikami, N. Ando, E. Guilmeau, and R. Funahashi, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 45, 4152 (2006). 10.1143/JJAP.45.4152
- (2006) Jpn. J. Appl. Phys., Part 1 , vol.45 , pp. 4152
- Mikami, M.¹ Ando, N.² Guilmeau, E.³ Funahashi, R.⁴

9
- 67651115847
- JOELFJ 1385-3449,. 10.1007/s10832-007-9297-x
- Y. H. Liu, Y. H. Lin, L. Jiang, C. W. Nan, and Z. J. Shen, J. Electroceram. JOELFJ 1385-3449 21, 748 (2008). 10.1007/s10832-007-9297-x
- (2008) J. Electroceram. , vol.21 , pp. 748
- Liu, Y.H.¹ Lin, Y.H.² Jiang, L.³ Nan, C.W.⁴ Shen, Z.J.⁵

10
- 0037349858
- JAPIAU 0021-8979,. 10.1063/1.1542942
- Y. Q. Zhou, I. Matsubara, S. Horii, T. Takeuchi, R. Funahashi, M. Shikano, J. Shimoyama, K. Kishio, W. Shin, N. Izu, and N. Murayama, J. Appl. Phys. JAPIAU 0021-8979 93, 2653 (2003). 10.1063/1.1542942
- (2003) J. Appl. Phys. , vol.93 , pp. 2653
- Zhou, Y.Q.¹ Matsubara, I.² Horii, S.³ Takeuchi, T.⁴ Funahashi, R.⁵ Shikano, M.⁶ Shimoyama, J.⁷ Kishio, K.⁸ Shin, W.⁹ Izu, N.¹⁰ Murayama, N.¹¹

11
- 30344449167
- JAPLD8 0021-4922,. 10.1143/JJAP.44.L966
- A. Sakai, T. Kanno, S. Yotsuhashi, A. Odagawa, and H. Adachi, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 44, L966 (2005). 10.1143/JJAP.44.L966
- (2005) Jpn. J. Appl. Phys., Part 2 , vol.44 , pp. 966
- Sakai, A.¹ Kanno, T.² Yotsuhashi, S.³ Odagawa, A.⁴ Adachi, H.⁵

12
- 68049148514
- JCRGAE 0022-0248,. 10.1016/j.jcrysgro.2009.06.044
- T. Sun, J. Ma, Q. Y. Yan, Y. Z. Huang, J. L. Wang, and H. H. Hng, J. Cryst. Growth JCRGAE 0022-0248 311, 4123 (2009). 10.1016/j.jcrysgro.2009.06.044
- (2009) J. Cryst. Growth , vol.311 , pp. 4123
- Sun, T.¹ Ma, J.² Yan, Q.Y.³ Huang, Y.Z.⁴ Wang, J.L.⁵ Hng, H.H.⁶

13
- 28344435658
- APPLAB 0003-6951,. 10.1063/1.2117615
- Y. F. Hu, E. Sutter, W. D. Si, and Q. Li, Appl. Phys. Lett. APPLAB 0003-6951 87, 171912 (2005). 10.1063/1.2117615
- (2005) Appl. Phys. Lett. , vol.87 , pp. 171912
- Hu, Y.F.¹ Sutter, E.² Si, W.D.³ Li, Q.⁴

14
- 33746281103
- APPLAB 0003-6951,. 10.1063/1.2234277
- K. Sugiura, H. Ohta, K. Nomura, M. Hirano, H. Hosono, and K. Koumoto, Appl. Phys. Lett. APPLAB 0003-6951 89, 032111 (2006). 10.1063/1.2234277
- (2006) Appl. Phys. Lett. , vol.89 , pp. 032111
- Sugiura, K.¹ Ohta, H.² Nomura, K.³ Hirano, M.⁴ Hosono, H.⁵ Koumoto, K.⁶

15
- 0035846181
- NATUAS 0028-0836,. 10.1038/35098012
- R. Venkatasubramanian, E. Siivola, T. Colpitts, and B. O'Quinn, Nature (London) NATUAS 0028-0836 413, 597 (2001). 10.1038/35098012
- (2001) Nature (London) , vol.413 , pp. 597
- Venkatasubramanian, R.¹ Siivola, E.² Colpitts, T.³ O'Quinn, B.⁴

16
- 0001173915
- PLRBAQ 0556-2805,. 10.1103/PhysRevB.47.12727
- L. D. Hicks and M. S. Dresselhaus, Phys. Rev. B PLRBAQ 0556-2805 47, 12727 (1993). 10.1103/PhysRevB.47.12727
- (1993) Phys. Rev. B , vol.47 , pp. 12727
- Hicks, L.D.¹ Dresselhaus, M.S.²

17
- 0036246693
- JUPSAU 0031-9015,. 10.1143/JPSJ.71.491
- Y. Miyazaki, M. Onoda, T. Oku, M. Kikuchi, Y. Ishii, Y. Ono, Y. Morii, and T. Kajitani, J. Phys. Soc. Jpn. JUPSAU 0031-9015 71, 491 (2002). 10.1143/JPSJ.71.491
- (2002) J. Phys. Soc. Jpn. , vol.71 , pp. 491
- Miyazaki, Y.¹ Onoda, M.² Oku, T.³ Kikuchi, M.⁴ Ishii, Y.⁵ Ono, Y.⁶ Morii, Y.⁷ Kajitani, T.⁸

18
- 34548235527
- APPLAB 0003-6951,. 10.1063/1.2771089
- W. B. Luo, J. Zhu, Y. R. Li, X. P. Wang, D. Zhao, J. Xiong, and Y. Zhang, Appl. Phys. Lett. APPLAB 0003-6951 91, 082501 (2007). 10.1063/1.2771089
- (2007) Appl. Phys. Lett. , vol.91 , pp. 082501
- Luo, W.B.¹ Zhu, J.² Li, Y.R.³ Wang, X.P.⁴ Zhao, D.⁵ Xiong, J.⁶ Zhang, Y.⁷

19
- 0344530769
- PLRBAQ 0556-2805,. 10.1103/PhysRevB.68.134423
- J. Sugiyama, J. H. Brewer, E. J. Ansaldo, H. Itahara, K. Dohmae, Y. Seno, C. Xia, and T. Tani, Phys. Rev. B PLRBAQ 0556-2805 68, 134423 (2003). 10.1103/PhysRevB.68.134423
- (2003) Phys. Rev. B , vol.68 , pp. 134423
- Sugiyama, J.¹ Brewer, J.H.² Ansaldo, E.J.³ Itahara, H.⁴ Dohmae, K.⁵ Seno, Y.⁶ Xia, C.⁷ Tani, T.⁸

20
- 59749098223
- APAMFC 0947-8396,. 10.1007/s00339-008-4849-8
- J. G. Cheng, Y. Sui, Y. Wang, X. J. Wang, and W. H. Su, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 94, 911 (2009). 10.1007/s00339-008-4849-8
- (2009) Appl. Phys. A: Mater. Sci. Process. , vol.94 , pp. 911
- Cheng, J.G.¹ Sui, Y.² Wang, Y.³ Wang, X.J.⁴ Su, W.H.⁵

21
- 76949097129
- JAPIAU 0021-8979,. 10.1063/1.3291125
- Y. Wang, Y. Sui, X. J. Wang, W. H. Su, and X. Y. Liu, J. Appl. Phys. JAPIAU 0021-8979 107, 033708 (2010). 10.1063/1.3291125
- (2010) J. Appl. Phys. , vol.107 , pp. 033708
- Wang, Y.¹ Sui, Y.² Wang, X.J.³ Su, W.H.⁴ Liu, X.Y.⁵

22
- 0742285728
- JAPIAU 0021-8979,. 10.1063/1.1631732
- Y. Q. Zhou, I. Matsubara, W. S. Shin, N. Izu, and N. Murayama, J. Appl. Phys. JAPIAU 0021-8979 95, 625 (2004). 10.1063/1.1631732
- (2004) J. Appl. Phys. , vol.95 , pp. 625
- Zhou, Y.Q.¹ Matsubara, I.² Shin, W.S.³ Izu, N.⁴ Murayama, N.⁵

23
- 2342424579
- PLRBAQ 0556-2805,. 10.1103/PhysRevB.69.125410
- T. Takeuchi, T. Kondo, T. Takami, H. Takahashi, H. Ikuta, U. Mizutani, K. Soda, R. Funahashi, M. Shikano, M. Mikami, S. Tsuda, T. Yokoya, S. Shin, and T. Muro, Phys. Rev. B PLRBAQ 0556-2805 69, 125410 (2004). 10.1103/PhysRevB.69. 125410
- (2004) Phys. Rev. B , vol.69 , pp. 125410
- Takeuchi, T.¹ Kondo, T.² Takami, T.³ Takahashi, H.⁴ Ikuta, H.⁵ Mizutani, U.⁶ Soda, K.⁷ Funahashi, R.⁸ Shikano, M.⁹ Mikami, M.¹⁰ Tsuda, S.¹¹ Yokoya, T.¹² Shin, S.¹³ Muro, T.¹⁴

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