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Journal of Crystal Growth

Volumn 311, Issue 16, 2009, Pages 4123-4128

Influence of pulsed laser deposition rate on the microstructure and thermoelectric properties of Ca3Co4O9 thin films

(6) Sun, T a Ma, J a Yan, Q Y a Huang, Y Z a Wang, J L a Hng, H H a

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

A1. Atomic force microscopy; A1. Surface structure; A1. X ray diffraction; A3. Laser epitaxy; B1. Oxides

Indexed keywords

A1. ATOMIC FORCE MICROSCOPY; A1. SURFACE STRUCTURE; A1. X-RAY DIFFRACTION; A3. LASER EPITAXY; B1. OXIDES;

ATOMIC FORCE MICROSCOPY; ATOMS; CALCIUM; COALESCENCE; COBALT COMPOUNDS; CRYSTAL GROWTH; DEPOSITION RATES; DIFFRACTION; ELECTRIC NETWORK ANALYSIS; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; FILM GROWTH; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; LASERS; MICROSTRUCTURE; OXYGEN; PULSED LASER DEPOSITION; SURFACE STRUCTURE; THIN FILM DEVICES; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

DEPOSITION;

EID: 68049148514 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2009.06.044 Document Type: Article

Times cited : (37)

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