Effect of ultrasonic frequency on electrochemical Si etching in porous Si layer transfer process for thin film solar cell fabrication

Solar Energy Materials and Solar Cells

Volumn 95, Issue 1, 2011, Pages 77-80

  Lee, Ju Young ^a   Han, Wone Keun ^a   Lee, Jae Ho ^a  

^a Hong Ik University   (South Korea)

Author keywords

Electrochemical etching; Layer transfer; Porous silicon; Ultrasonic

Indexed keywords

CHEMICAL MIXTURES; LAYER TRANSFER; LAYER TRANSFER PROCESS; MONOCRYSTALLINE; POROUS SI; SI DEVICES; SI FILMS; SI SUBSTRATES; THIN FILM SOLAR CELLS; ULTRASONIC FREQUENCY; UNIFORM SIZE;

ETHANOL; FABRICATION; POROUS SILICON; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SUBSTRATES; ULTRASONIC WAVES; ULTRASONICS;

ELECTROCHEMICAL ETCHING;

EID: 78149360843     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2010.04.058     Document Type: Conference Paper

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