A novel method of fabricating porous silicon material: Ultrasonically enhanced anodic electrochemical etching

Solid State Communications

Volumn 127, Issue 8, 2003, Pages 583-588

  Liu, Y ^a,a   Xiong, Z H ^a   Xu, S H ^a   Liu, X B ^a   Ding, X M ^a   Hou, X Y ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

A. Nanostructures; D. Optical properties; E. Ultrasonics

Indexed keywords

ELECTROCHEMISTRY; ETCHING; SILICON; ULTRASONIC APPLICATIONS;

HYDROGEN BUBBLES;

POROUS MATERIALS;

EID: 0042229167     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1098(03)00489-7     Document Type: Article

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