SCOPUS 정보 검색 플랫폼

Solar Energy Materials and Solar Cells

Volumn 95, Issue 1, 2011, Pages 175-178

Microcrystalline germanium thin films prepared by reactive RF sputtering

(3) Yoshida, N a Hatano, Y a Isomura, M a

a TOKAI UNIVERSITY (Japan)

Author keywords

Microcrystalline germanium; Narrow gap semiconductor; Reactive sputtering; Thermo photo voltaic

Indexed keywords

CRYSTALLINE-TO-AMORPHOUS; CRYSTALLINITIES; FLOWRATE RATIO; GRAIN-BOUNDARY DEFECTS; ION DAMAGE; MICROCRYSTALLINE GERMANIUM; MIXED STRUCTURE; NARROW GAP; NARROW-GAP SEMICONDUCTORS; RF-SPUTTERING; SPUTTERING GAS; STRUCTURE CHANGE; THERMO-PHOTO-VOLTAIC;

CRYSTALLINE MATERIALS; INERT GASES; IONS; NEON; PHOTOSENSITIVITY; REACTIVE SPUTTERING; SEMICONDUCTOR MATERIALS; XENON;

GERMANIUM;

EID: 78149360029 PISSN: 09270248 EISSN: None Source Type: Journal
DOI: 10.1016/j.solmat.2010.04.031 Document Type: Conference Paper

Times cited : (14)

References (6)

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