Poly-crystalline Ge thin films prepared by RF sputtering method for thermo photo voltaic application

Materials Research Society Symposium Proceedings

Volumn 862, Issue , 2005, Pages 207-212

  Hoshi, Daisuke ^a   Nakamura, Isao ^a   Isomura, Masao ^a  

^a TOKAI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; GASES; GERMANIUM COMPOUNDS; PLASMAS; POLYCRYSTALLINE MATERIALS; SPUTTERING;

RF SPUTTERING; SPUTTERING GASES;

THIN FILMS;

EID: 30544447543     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-862-a6.5     Document Type: Conference Paper

References (5)

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3. S. Wojtczuk, P. Colter, G. Charache and B. Campbell, Proc. IEEE 25th PVSC; 1996; pp77-80
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5. Pallik, E. D; Hand book "Optical Constants of Solid"; 1991 (New York:Academic); p321