Microcrystalline germanium thin films prepared by the reactive RF sputtering method

Journal of Non-Crystalline Solids

Volumn 354, Issue 19-25, 2008, Pages 2113-2116

  Sugita, Masatoshi ^a   Sano, Yukio ^a   Tomita, Yuki ^a   Isomura, Masao ^a  

^a TOKAI UNIVERSITY   (Japan)

Author keywords

Germanium; Microcrystallinity; Photovoltaics; Solar cells; Sputtering

Indexed keywords

GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; PHOTOSENSITIVITY; SEMICONDUCTING GERMANIUM COMPOUNDS; THIN FILMS;

MICROCRYSTALLINE GERMANIUM; PIN STRUCTURE DEVICES; THERMO-PHOTO-VOLTAIC (TPV);

CRYSTALLINE MATERIALS;

EID: 42649098935     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.09.020     Document Type: Article

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