SCOPUS 정보 검색 플랫폼

Applied Surface Science

Volumn 257, Issue 2, 2010, Pages 591-595

Effect of temperature and silicon resistivity on the elaboration of silicon nanowires by electroless etching

(5) Fellahi, Ouarda a Hadjersi, Toufik a Maamache, Mustapha b Bouanik, Sihem a Manseri, Amar a

a L'Unite de Developpement de la Technologie du Silicium (Algeria)

b FERHAT ABBAS UNIVERSITY (Algeria)

Author keywords

Ag nanoparticles; Catalyst; Electroless etching; Silicon nanowires

Indexed keywords

CATALYSTS; ETCHING; HYDROFLUORIC ACID; MASS SPECTROMETRY; METAL NANOPARTICLES; NANOCATALYSTS; NANOWIRES; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SILVER COMPOUNDS; SILVER NANOPARTICLES;

EFFECT OF TEMPERATURE; ELECTROLESS ETCHINGS; ELECTROLESS METAL DEPOSITION; ETCHING TEMPERATURE; FORMATION PROCESS; SECONDARY IONS; SILICON NANOWIRES; SILICON RESISTIVITY;

SILICON WAFERS;

EID: 78049528436 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2010.07.039 Document Type: Article

Times cited : (11)

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