Formulation of selective etch chemistries for silicon dioxide-based films

Journal of the Electrochemical Society

Volumn 157, Issue 6, 2010, Pages

  Pande, Ashish A ^a   Levitin, Galit ^a   Hess, Dennis W ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AQUEOUS/ORGANIC SOLVENTS; BOROPHOSPHOSILICATE GLASS; CRITICAL ISSUES; DEVICE FABRICATIONS; ETCH CHEMISTRY; ETCH MECHANISM; ETCH SELECTIVITY; FILM MATERIALS; ION SOLVATION; MICRO ELECTRO MECHANICAL SYSTEM; SELECTIVE ETCH; SILICON DIOXIDE;

ETCHING; MEMS; MICROELECTROMECHANICAL DEVICES; SURFACE ACTIVE AGENTS; WATER CONTENT;

SILICA;

EID: 77958617167     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3374176     Document Type: Article

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