Influence of deposition temperature on structure and morphology of nanostructured SnO2 films synthesized by pulsed laser deposition

Materials Letters

Volumn 65, Issue 2, 2011, Pages 146-149

  Sinha, S K ^a   Bhattacharya, R ^b   Ray, S K ^a   Manna, I ^a,c  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

^b INDIAN INSTITUTE OF ENGINEERING SCIENCE AND TECHNOLOGY   (India)

^c CSIR CENTRAL GLASS AND CERAMIC RESEARCH INSTITUTE   (India)

Author keywords

Atomic force microscopy; Defects; PLD; Thin films

Indexed keywords

AMORPHOUS FILMS; ATMOSPHERIC TEMPERATURE; ATOMIC FORCE MICROSCOPY; DEFECTS; OXIDE FILMS; OXYGEN VACANCIES; PULSED LASER DEPOSITION; PULSED LASERS; SURFACE TOPOGRAPHY; THIN FILMS; TIN OXIDES; TOPOGRAPHY;

AS-DEPOSITED FILMS; DEPOSITION TEMPERATURES; DIFFERENT SUBSTRATES; NANOSTRUCTURED TIN OXIDES; PHOTOLUMINESCENCE MEASUREMENTS; PULSED-LASER DEPOSITION TECHNIQUE; STRUCTURE AND MORPHOLOGY; SUBSTRATE TEMPERATURE;

DEPOSITION;

EID: 77958582371     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2010.09.076     Document Type: Article

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