High-rate reactive deposition of transparent SiO2 films containing low amount of Zr from molten magnetron target

Thin Solid Films

Volumn 519, Issue 2, 2010, Pages 775-777

  Musil, Jindrich ^a,b   Satava, Vaclav ^a   Baroch, Pavel ^a  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

^b INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

Deposition rate; Evaporation; Molten target; Reactive deposition; Sputtering; Target power density; Thin films

Indexed keywords

DUAL MAGNETRONS; HIGH RATE; MOLTEN TARGET; REACTIVE DEPOSITION; SOLID TARGETS; TARGET MATERIALS; TARGET POWER DENSITY; TRANSPARENT OXIDE FILMS;

DEPOSITION; DEPOSITION RATES; EVAPORATION; MAGNETRONS; SILICON COMPOUNDS; THIN FILMS; VAPOR DEPOSITION; ZIRCONIUM;

OXIDE FILMS;

EID: 77958493833     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.09.009     Document Type: Article

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