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Volumn 97, Issue 15, 2010, Pages

Reduction of low-frequency 1/f noise in Al-AlOx-Al tunnel junctions by thermal annealing

Author keywords

[No Author keywords available]

Indexed keywords

1/F NOISE; ANNEALING PROCESS; HIGH VACUUM; LINEAR DEPENDENCE; LOW FREQUENCY; ORDER OF MAGNITUDE; TEMPERATURE DEPENDENCE; THERMAL-ANNEALING; TUNNELING BARRIER; VACUUM CHAMBERS;

EID: 77958098175     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3500823     Document Type: Article
Times cited : (18)

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    • R ∼1/A, and the fact that our junctions have ∼1.7 smaller junction area, even better relative noise performance was seen in our junctions."
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.