Tailoring the dispersion behavior of silicon nanophotonic slot waveguides

Optics Express

Volumn 18, Issue 20, 2010, Pages 20839-20844

  Mas, Sara ^a   Caraquitena, José ^a   Galán, José V ^a   Sanchis, Pablo ^a   Martí, Javier ^a  

^a UNIVERSITAT POLITÈCNICA DE VALÈNCIA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

NANOPHOTONICS; WAVEGUIDES;

ASYMMETRIC GEOMETRY; BROAD SPECTRAL; CROSS SECTIONAL AREA; DISPERSION BEHAVIOR; DISPERSION PROFILE; DISPERSION PROPERTIES; FILL FACTOR; PEAK DISPERSION; SILICON CHANNEL; SLOT WAVEGUIDE; WAVEGUIDE PARAMETER; WAVEGUIDE WIDTHS;

DISPERSIONS;

SILICON;

ALGORITHM; ARTICLE; CHEMISTRY; COMPUTER AIDED DESIGN; EQUIPMENT DESIGN; METHODOLOGY; NANOTECHNOLOGY; OPTICAL INSTRUMENTATION; OPTICS; REFRACTOMETRY;

ALGORITHMS; COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; NANOTECHNOLOGY; OPTICAL DEVICES; OPTICS AND PHOTONICS; REFRACTOMETRY; SILICON;

EID: 77957983192     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.020839     Document Type: Article

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