The Materials Science of Thin Films

The Materials Science of Thin Films

Volumn , Issue , 2013, Pages 1-704

  Ohring, Milton ^a  

^a Stevens Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; COATINGS; DIAMOND FILMS; DIFFUSION COATINGS; FILMS; OPTICAL RECORDING; STUDENTS; THERMAL BARRIER COATINGS; VAPOR DEPOSITION;

CHEMICAL CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION PROCESS; EMERGING TECHNOLOGIES; GRADUATE STUDENTS; HIGH TC SUPERCONDUCTORS; NUCLEATION AND GROWTH; OPTICAL RECORDING MATERIAL; SCIENCE AND TECHNOLOGY;

THIN FILMS;

EID: 84940850805     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1016/C2009-0-22199-4     Document Type: Book

References (401)

1. Hunt L.B. Gold Bull. 1976, 9:24.
2. Vittori O. Gold Bull. 1979, 12:35.
3. Nicholson E.D. Gold Bull. 1979, 12:161.
4. Ashby M.F., Jones D.R.H. Engineering Materials 1980, Vols. 1 and 2. Pergamon Press, Oxford, and 1986.
5. Barrett C.R., Nix W.D., Tetelman A.S. The Principles of Engineering Materials 1973, Prentice Hall, Englewood Cliffs, NJ.
6. Wyatt O.H., Dew Hughes D. Metals, Ceramics and Polymers 1974, Cambridge University Press, London.
7. Wulff J., et al. The Structure and Properties of Materials 1964, Vols. 1-4. Wiley, New York.
8. Ohring M. Engineering Materials Science 1995, Academic Press, San Diego.
9. Van Vlack L.H. Elements of Materials Science and Engineering 1989, Addison-Wesley, Reading, MA.
10. Cullity B.D. Elements of X-ray Diffraction 1978, Addison-Wesley, Reading, MA.
11. Barrett C.S., Massalski T.B. The Structure of Metals 1966, McGraw-Hill, New York.
12. Thomas G., Goringe M.J. Transmission Electron Microscopy of Materials 1979, Wiley, New York.
13. Friedel J. Dislocations 1964, Pergamon Press, New York.
14. Cottrell A.H. Mechanical Properties of Matter 1964, Wiley, New York.
15. Hull D. Introduction to Dislocations 1965, Pergamon Press, New York.
16. Cottrell A.H. Theoretical Structural Metallurgy 1957, St. Martin's Press, New York.
17. Cottrell A.H. An Introduction to Metallurgy 1967, St. Martin's Press, New York.
18. Kingery W.D., Bowen H.K., Uhlmann D.R. Introduction to Ceramics 1976, Wiley, New York.
19. Doremus R.H. Glass Science 1973, Wiley, New York.
20. Sze S.M. Semiconductor Devices-Physics and Technology 1985, Wiley, New York.
21. Grove A.S. Physics and Technology of Semiconductor Devices 1967, Wiley, New York.
22. Mayer J.M., Lau S.S. Electronic Materials Science: For Integrated Circuits in Si and GaAs 1990, Macmillan, New York.
23. Swalin R.A. Thermodynamics of Solids 1962, Wiley, New York.
24. Lupis C.H. Chemical Thermodynamics of Materials 1983, North-Holland, New York.
25. Shewmon P.G. Diffusion in Solids 1963, McGraw-Hill, New York.
26. Verhoeven J. Fundamentals of Physical Metallurgy 1975, Wiley, New York.
27. Porter D.A., Easterling K.E. Phase Transformations in Metals and Alloys 1981, Van Nostrand Reinhold, Berkshire, England.
28. H. S. Carslaw, and J. C. Jaeger, Conduction of Heat in Solids, Oxford University Press, London (1959).
29. Crank J. The Mathematics of Diffusion 1964, Oxford University Press, London.
30. Glang R. Handbook of Thin Film Technology 1970, *, McGraw-Hill, New York. L.I. Maissel, R. Glang (Eds.).
31. Roth A. Vacuum Technology 1976, *, North-Holland, Amsterdam.
32. Dushman S. Scientific Foundations of Vacuum Techniques 1962, *, Wiley, New York.
33. Glang R., Holmwood R.A., Kurtz J.A. Handbook of Thin Film Technology 1970, McGraw-Hill, New York. L.I. Maissel, R. Glang (Eds.).
34. J. M. Lafferty, Techniques of High Vacuum, GE Report No. 64-RL-3791G (1964).
35. R. W. Roberts, An Outline of Vacuum Technology, GE Report No. 64-RL 3394C (1964).
36. "Vacuum Technology: Its Foundations, Formulae and Tables". Product and Vacuum Technology Reference Book 1986, Leybold-Heraeus, San Jose, CA.
37. Grove W.R. Phil. Trans. Roy. Soc., London A 1852, 142:87.
38. Faraday M. Phil. Trans. 1857, 147:145.
39. Glang R. Handbook of Thin Film Technology 1970, McGraw-Hill, New York. L.I. Maissel, R. Glang (Eds.).
40. Vossen J.L., Cuomo J.J. Thin Film Processes 1978, Academic Press, New York. J.L. Vossen, W. Kern (Eds.).
41. Westwood W.D. Microelectronic Materials and Processes 1989, Kluwer Academic, Dordrecht. R.A. Levy (Ed.).
42. Chapman B.N. Glow Discharge Processes 1980, Wiley, New York.
43. Lupis C.H.P. Chemical Thermodynamics of Materials 1983, North-Holland, Amsterdam.
44. Honig R.E. RCA Rev. 1962, 23:567.
45. Pulker H.K. Coatings on Glass 1984, Elsevier, New York.
46. Examples taken from Physical Vapor Deposition 1976, Airco-Temescal.
47. Holland L. Vacuum Deposition of Thin Films 1956, Wiley, New York.
48. Ting C.H., Neureuther A.R. Solid State Technol. 1982, 25(2):115.
49. Caswell H.L. Physics of Thin Films 1963, Vol. 1. Academic Press, New York. G. Hass (Ed.).
50. Hartsough L.D., Denison D.R. Solid State Technology 1979, 22(12):66.
51. Handbook-The Optical Industry and Systems Directory, H-11 (1979).
52. Grapper E.B. J. Vac. Sci. Technol. 1987, 5A(4):2718. 8, 333 (1971).
53. Archibald P., Parent E. Solid State Technol. 1976, 19(7):32.
54. Mattox D.M. J. Vac. Sci. Technol. 1989, A7(3):1105.
55. Glaser A.B., Subak-Sharpe G.E. Integrated Circuit Engineering 1979, Addison-Wesley, Reading, MA.
56. Sigmund P. Phys. Rev. 1969, 184:383.
57. Lamont L.T. Solid State Technol. 1979, 22(9):107.
58. Thornton J.A. Thin Solid Films 1978, 54:23.
59. Thornton J.A. Thin Film Processes 1978, Academic Press, New York. J.L. Vossen, W. Kern (Eds.).
60. Koenig H.R., Maissel L.I. IBM J. Res. Dev. 1970, 14:168.
61. Westwood W.D. Physics of Thin Films 1989, Vol. 14. Academic Press, New York. M.H. Francombe, J.L. Vossen (Eds.).
62. Maissel L.I., Francombe M.H. An Introduction to Thin Films 1973, Gordon and Breach, New York.
63. Maissel L.I., Schaible P.M. J. Appl. Phys. 1965, 36:237.
64. Vossen J.L., O'Neill J.J. RCA Rev. 1968, 29:566.
65. Mattox D.M. J. Vac. Sci. Technol. 1973, 10:47.
66. Bunshah R.F., Deshpandey C. Physics of Thin Films 1987, Vol. 13. Academic Press, New York. M.H. Francombe, J.L. Vossen (Eds.).
67. Harper J.M.E., Cuomo J.J. J. Vac. Sci. Technol. 1982, 21(3):737.
68. Harper J.M.E., Cuomo J.J., Gambino R.J., Kaufman H.R. Ion Beam Modification of Surfaces 1984, Elsevier, Amsterdam. O. Auciello, R. Kelly (Eds.).
69. Takagi T. Physics of Thin Films 1987, Vol. 13. Academic Press, New York. M.H. Francombe, J.L. Vossen (Eds.).
70. W. L. Brown, M. F. Jarrold, R. L. McEachern, M. Sosnowski, G. Takaoka, H. Usui and I. Yamada, Nuclear Instruments and Methods in Physics Research, to be published (1991).
71. Kern W., Ban V.S. Thin Film Processes 1978, Academic Press, New York. J.L. Vossen, W. Kern (Eds.).
72. Kern W. Microelectronic Materials and Processes 1989, Kluwer Academic, Dordrecht. R.A. Levy (Ed.).
73. Yee K.K. Int. Metals Rev. 1978, 23:19.
74. Hastie J.W. High Temperature Vapors - Science and Technology 1975, Academic Press, New York.
75. Blocher J.M. Deposition Technologies for Films and Coatings 1982, Noyes, Park Ridge. NJ. R.F. Bunshah (Ed.).
76. Bryant W.A. J. Mat. Sci. 1977, 12:1285.
77. Schuegraf K.K. Handbook of Thin-Film Deposition Processes and Techniques 1988, Noyes, Park Ridge. NJ.
78. Schlichting J. Powder Metal Int. 1980, 12(3):141.
79. Wajda E.S., Kippenhan B.W., White W.H. IBM J. Res. Dev. 1960, 7:288.
80. Mizutani T., Yoshida M., Usui A., Watanabe H., Yuasa T., Hayashi I. Japan J. Appl. Phys. 1980, 19:L113.
81. Laudise R.A. The Growth of Single Crystals 1970, Prentice Hall, Englewood Cliffs, NJ.
82. Kubaschewski O., Evans E.L. Metallurgical Thermochemistry 1958, Pergamon Press, New York.
83. Stull D.R., Prophet H. JANAF Thermochemical Tables 1971, U.S. GPO, Washington, DC. 2nd ed.
84. Ban V.S., Gilbert S.L. J. Electrochem. Soc. 1975, 122(10):1382.
85. Siiti E., Hunt I.P., Sawyer D.H. J. Electrochem. Soc. 1974, 121:919.
86. Doherty J.E. J. Metals 1976, 28(6):6.
87. Anthony T.C., Fahrenbruch A.L., Bube R.H. J. Vac. Sci. Tech. 1984, A2(3):1296.
88. Rundle P.C. Int. J. Electron. 1968, 24:405.
89. Grove A.S. Physics and Technology of Semiconductor Devices 1967, Wiley, New York.
90. Ruska W.S. Microelectronic Processing 1987, McGraw-Hill, New York.
91. Bloem J., Claassen W.A.P. Philips Tech. Rev. 1983, 41:60. (1984).
92. Marcus R.B., Sheng T.T. Transmission Electron Microscopy of Silicon VLSI Circuits and Structures 1983, Wiley, New York.
93. Sze S.M. Semiconductor Devices - Physics and Technology 1985, Wiley, New York.
94. Adams A.C. VLSI Technology 1988, McGraw-Hill, New York. 2nd ed. S.M. Sze (Ed.).
95. Hollahan J.R., Rosier S.R. Thin Film Processes 1978, Academic Press, New York. J.L. Vossen, W. Kern (Eds.).
96. Rand M.J. J. Vac. Sci. Tech. 1979, 16(2):420.
97. Veprek S. Thin Solid Films 1985, 130:135.
98. S. Matuso in Ref. 7.
99. Osgood R.M., Gilgen H.H. Ann. Rev. Mater. Sci. 1985, 15:549.
100. R. L. Abber in Ref. 7.
101. Stringfellow G.B. Organo Vapor-Phase Epitaxy: Theory and Practice 1989, Academic Press, Boston.
102. Dupuis R.D. Science 1984, 226:623.
103. Lewis B., Anderson J.C. Nucleation and Growth of Thin Films 1978, Academic Press, London.
104. Vook R.W. Int. Metals Rev. 1982, 27:209.
105. Neugebauer C.A. Handbook of Thin-Film Technology 1970, McGraw Hill, New York. L.I. Maissel, R. Glang (Eds.).
106. Reichelt K. Vacuum 1988, 38:1083.
107. Venables J.A., Spiller G.D.T., Hanbücken M. Rep. Prog. Phys. 1984, 47:399.
108. Walton D., Rhodin T.N., Rollins R.W. J. Chem. Phys. 1963, 38:2698.
109. Yang H.M., Flynn C.P. Phys. Rev. Lett. 1989, 62:2476.
110. Robinson V.N.E., Robins J.L. Thin Solid Films 1974, 20:155.
111. German R.M. Powder Metallurgy Science 1984, Metal Powder Industries Federation, Princeton, NJ.
112. Pashley D.W., Stowell M.J. J. Vac. Sci. Tech. 1966, 3:156.
113. Kashchiev D. Surface Science 1979, 86:14.
114. Chopra K.L. Thin-Film Phenomena 1969, McGraw-Hill, New York.
115. Rhead G.E. J. Vac. Sci. Tech. 1976, 13:603.
116. Vook R.W., Oral B. Gold Bull. 1987, 20(1/2):13.
117. Grunbaum E. Epitaxial Growth B 1976, Academic Press, New York. J.W. Matthews (Ed.).
118. Movchan B.A., Demchishin A.V. Phys. Met. Metallogr. 1969, 28:83.
119. Thornton J.A. Ann. Rev. Mater. Sci. 1977, 7:239.
120. Hentzell H.T.G., Grovenor C.R.M., Smith D.A. J. Vac. Sci. Tech. 1984, A2:218.
121. Chisholm M.F., Smith D.A. Advanced Techniques for Microstructural Characterization 1988, Trans-Tech. Publ., Switzerland. R. Krishnan, T.R. Anantharaman, C.S. Pande, O.P. Arora (Eds.).
122. Nieuwenhuizen J.M., Haanstra H.B. Philips Tech. Rev. 1966, 27:87.
123. Messier R., Giri A.P., Roy R. J. Vac. Sci. Tech. 1984, A2:500.
124. Müller K.H. J. Appl. Phys. 1985, 58:2573.
125. Pulker H. Coatings on Glass 1984, Elsevier, Amsterdam.
126. Nakahara S. Thin Sold Films 1979, 64:149.
127. Buckel W. Z. Phys. 1954, 138:136.
128. Chen H.S., Leamy H.J., Miller C.E. Ann. Rev. Mater. Sci. 1980, 10:363.
129. Mader S. The Use of Thin Films in Physical Investigations 1966, Academic Press, New York. J.C. Anderson (Ed.).
130. Newcomb S.B., Tu K.N. Appl. Phys. Lett. 1986, 48:1436.
131. Nowick A.S., Mader S.R. IBM J. Res. Dev. 1965, 9:358.
132. Bragg W.L., Nye J.F. Proc. Roy. Soc. 1947, A190:474.
133. Bindell J.B. VLSI Technology 1988, McGraw-Hill, New York. 2nd ed. S.M. Sze (Ed.).
134. Pliskin W.A., Zanin S.J. Handbook of Thin Films Technology 1970, McGraw-Hill, New York. L.I. Maissel, R. Glang (Eds.).
135. Chopra K.L. Thin Film Phenomena 1969, McGraw-Hill, New York.
136. Pulker H.K. Coatings on Glass 1984, Elsevier, Amsterdam.
137. Tolansky S. Multiple Beam Interference Microscopy of Metals 1970, Academic Press, London.
138. Maissel L.I., Francombe M.H. An Introduction to Thin Films 1973, Gordon and Breach, New York.
139. Theeten J.B., Aspenes D.E. Ann. Rev. Mater. Sci. 1981, 11:97.
140. Glang R. Handbook of Thin-Film Technology 1970, McGraw-Hill, New York. L.I. Maissel, R. Glang (Eds.).
141. Goldstein J.I., Newbury D.E., Echlin P., Joy D.C., Fiori C., Lifshin E. Scanning Electron Microscopy and X-Ray Microanalysis 1981, Plenum, New York.
142. Thomas G., Goringe M.J. Transmission Electron Microscopy of Materials 1979, Wiley, New York.
143. Marcus R.B., Sheng T.T. Transmission Electron Microscopy of Silicon VLSI Circuits and Structures 1983, Wiley, New York.
144. Tu K.N. J. Appl. Phys. 1972, 43:1303.
145. Feldman L.C., Mayer J.W. Fundamentals of Thin-Film Analysis 1986, North-Holland, New York.
146. Practical Surface Analysis by Auger and Photoelectron Spectroscopy 1984, Wiley, New York. D. Briggs, M.P. Seah (Eds.).
147. Methods of Surface Analysis 1975, Elsevier, Amsterdam. A.W. Czanderna (Ed.).
148. Applied Electron Spectroscopy for Chemical Analysis 1982, Wiley, New York. H. Windawi, F.F.-L. Ho (Eds.).
149. Ion Beams for Materials Analysis 1989, Academic Press, Sydney. J.R. Bird, J.S. Williams (Eds.).
150. Benninghoven A.W., Rudenauer F.G., Werner H.W. Secondary Ion Mass Spectrometry-Basic Concepts, Instrumental Aspects, Applications and Trends 1987, Wiley, New York.
151. Werner H.W., Garten P.P.H. Rep. Prog. Phys. 1984, 47:221.
152. Chu W.K., Mayer J.W., Nicolet M.A., Buck T.M., Amsel G., Eisen F. Thin Solid Films 1963, 17:1.
153. Degreve F., Thorne N.A., Lang J.M. J. Mat. Sci. 1988, 23:4181.
154. Royer L. Bull. Soc. Fr. Mineral Cristallogr. 1928, 51:7.
155. Prutton M. Surface Physics 1983, Clarendon Press, Oxford. 2nd ed.
156. Prinz G.A. MRS Bull. 1988, XIII(6):28.
157. Frank F.C., van der Merwe J.H. Proc. Roy. Soc. 1949, A189:205.
158. Matthews J.W. Epitaxial Growth 1975, Academic Press, New York. J.W. Matthews (Ed.).
159. Matthews J.W. J. Vac. Sci. Tech. 1975, 12:126.
160. Stringfellow G.B. Rep. Prog. Phys. 1982, 45:469.
161. Bean J.C. Silicon-Molecular Beam Epitaxy 1988, CRC Press, Boca Raton, FL. E. Kasper, J.C. Bean (Eds.).
162. Bean J.C. Physics Today 1986, 39(10):2.
163. Sze S.M. Semiconductor Devices-Physics and Technology 1985, McGraw-Hill, New York.
164. Mayer J.W., Lau S.S. Electronic Materials Science: For Integrated Circuits in Si and GaAs 1990, Macmillan, New York.
165. Pamplin B.R. Handbook of Chemistry and Physics 1980, CRC Press, Boca Raton, FL. R.C. Weast (Ed.).
166. Ichinose H., Ishida Y., Sakaki H. JOEL News 1988, 26E(1):8.
167. Kuech T.F., Wolford D.J., Potoemski R., Bradley J.A., Kelleher K.H., Yan D., Farrell J.P., Lesser P.M.S., Pollack F.H. Appl. Phys. Lett. 1987, 51:505.
168. Casey H.C., Sell D.D., Panish M.B. Appl. Phys. Lett. 1974, 24:63.
169. Gunshor R.L., Kolodziejski L.A., Nurmikko A.V., Otsuka N. Ann. Rev. Mater. Sci. 1988, 18:325.
170. Celler G.K., Robinson McD., Trimble L.E. J. Electrochem. Soc. 1985, 132:211.
171. Green M.L., Brasen D., Luftman H., Kannan V.C. J. Appl. Phys. 1989, 65:2558.
172. Cho A.Y. Thin Solid Films 1983, 100:291.
173. Ploog K. Ann. Rev. Mater. Sci. 1981, 11:171.
174. Panish M.B., Temkin H. Ann. Rev. Mater. Sci. 1989, 19:209.
175. Herman M.A., Sitter H. Molecular Beam Epitaxy-Fundamentals and Current Status 1989, Springer-Verlag, Berlin.
176. Cho A.Y., Arthur J.R. Prog. Solid State Chem. 1975, 10:157.
177. Olsen G.H. GaInAsP Alloy Semiconductors 1982, Wiley, New York. T.P. Pearsall (Ed.).
178. Macrander A.T. Ann. Rev. Mater. Sci. 1988, 18:283.
179. B. Greenberg, Philips Laboratories, North American Philips Corp. Private communication.
180. Vandenberg J.M., Panish M.B., Temkin H., Hamm R.A. Appl. Phys. Lett. 1988, 53:1920.
181. Nicolet M.-A., Bartur M. J. Vac. Sci. Tech 1981, 19:786.
182. Balluffi R.W., Blakely J.M. Thin Solid Films 1975, 25:363.
183. Gjostein N.A. Diffusion 1973, American Society for Metals, Metals Park, Ohio.
184. Tsai J.C.C. VLSI Technology 1988, McGraw-Hill, New York. 2nd ed. S.M. Sze (Ed.).
185. Sze S.M. Semiconductor Devices-Physics and Technology 1985, Wiley, New York.
186. Jacobson D.C. Ion-Beam Studies of Noble Metal Diffusion in Amorphous Silicon Layers 1989, Stevens Institute of Technology, Ph.D. Thesis.
187. Fisher J.C. J. Appl. Phys. 1951, 22:74.
188. Whipple R.T. Phil. Mag. 1954, 45:1225.
189. Suzuoka T. Trans. Jap. Inst. Met. 1961, 2:25.
190. Harrison L.G. Trans. Faraday. Soc. 1961, 57:1191.
191. Low Temperature Diffusion and Applications to Thin Films 1975, Elsevier, Lausanne, also Thin Solid Films25 (1975). A. Gangulee, P.S. Ho, K.N. Tu (Eds.).
192. Thin Films-Interdiffusion and Reactions 1978, Wiley, New York. J.M. Poate, K.N. Tu, J.W. Mayer (Eds.).
193. Gupta D. Phys. Rev. 1973, 7:586.
194. Gupta D., Asai K.W. Thin Solid Films 1974, 22:121.
195. Hall P.M., Morabito J.M., Poate J.M. Thin Solid Films 1976, 33:107.
196. Tu K.N., Chu W.K., Mayer J.W. Thin Solids Films 1975, 25:403.
197. Tu K.N. Ann. Rev. Mater. Sci. 1985, 15:147.
198. Gupta D., Ho P.S. Thin Solid Films 1985, 72:399.
199. Hwang J.C.M., Pan J.D., Balluffi R.W. J. Appl. Phys. 1979, 50:1349.
200. Campisano S.U., Foti G., Rimini R., Mayer J.W. Phil. Mag. 1975, 31:903.
201. Ohring M., Rosenberg R. J. Appl. Phys. 1971, 42:5671.
202. Vaidya S., Sheng T.T., Sinha A.K. Appl. Phys. Lett. 1980, 36:464.
203. Nakamura K., Nicolet M.-A., Mayer J.W., Blattner R.J., Evans C.A. J. Appl. Phys. 1975, 46:4678.
204. Ottavio G. J. Vac. Sci. Tech. 1979, 16:1112.
205. Nicolet M.-A. Thin Solid Films 1978, 52:415.
206. Wittmer M. J. Vac. Sci. Tech. 1984, A2:273.
207. Grove A.S. Physics and Technology of Semiconductor Devices 1967, Wiley, New York.
208. Katz L.E. VLSI Technology 1988, McGraw-Hill, New York. 2nd ed. S.M. Sze (Ed.).
209. Gore G. Trans. Roy. Soc. (London) 1858, (Part 1):185.
210. Principles of Electronic Packaging 1989, McGraw-Hill, New York. D.P. Seraphim, R. Lasky, C.Y. Li (Eds.).
211. Hoffman R.W. Physics of Thin Films 1966, Vol. 3. Academic Press, New York. G. Hass, R.E. Thun (Eds.).
212. Neugebauer C.A. J. Appl. Phys. 1960, 32:1096.
213. Trimble L.E., Celler G.K. J. Vac. Sci. Tech. 1989, B7:1675.
214. Oliver W.C. MRS Bull. 1986, XII(5):15.
215. Nix W.D. Met. Trans. 1989, 20A:2217.
216. Stoney G.G. Proc. Roy. Soc. London 1909, A82:172.
217. Suhir E., Lee Y.-C. Handbook of Electronic Materials 1989, Vol. 1. ASM International, Metals Park, Ohio. C.A. Dostal (Ed.).
218. Campbell D.S. Handbook of Thin Film Technology 1970, McGraw-Hill, New York. L.I. Maissel, R. Glang (Eds.).
219. Klokholm E., Berry B.S. J. Electrochem. Soc. 1968, 115:823.
220. Cuthrell R.E., Mattox D.M., Peeples C.R., Dreike P.L., Lamppa K.P. J. Vac. Sci. Tech. 1988, A6(5):2914.
221. Ennos A.E. Appl. Opt. 1966, 5:51.
222. Pulker H.K. Coatings on Glass 1984, Elsevier, Amsterdam.
223. Wagner R.W., Sinha A.K., Sheng T.T., Levinstein H.J., Alexander F.B. J. Vac. Sci. Tech. 1974, 11:582.
224. Hoffman D.W., Thornton J.A. J. Vac. Sci. Tech. 1982, 20:355.
225. Buckel W. J. Vac. Sci. Tech. 1969, 6:606.
226. Hoffman R.W. Thin Solid Films 1976, 34:185.
227. Pulker H.K., Mäser J. Thin Solid Films 1979, 59:65.
228. Irene E.A., Tierney E., Angilello J. J. Electrochem. Soc. 1982, 129:2594.
229. Ashby M.F. Acta Met. 1972, 20:887.
230. Murakami M., Kuan T.S., Blech I.A. Treatise on Materials Science and Technology 1982, Vol. 24. Academic Press, New York. K.N. Tu, R. Rosenberg (Eds.).
231. Kircher C.J., Murakami M. Science 1980, 208:944.
232. Chaudhari P. J. Appl. Phys. 1974, 45:4339.
233. Chapman B.N. J. Vac. Sci. Tech. 1974, 11:106.
234. Steinmann P.A., Hintermann H.E. J. Vac. Sci. Tech. 1989, A7:2267.
235. Valli J. J. Vac. Sci. Tech. A 1986, 4:3007.
236. Sze S.M. Physics of Semiconductor Devices 1981, J. Wiley and Sons, New York. 2nd Ed.
237. Van der Pauw L.J. Philips Res. Repts. 1958, 13:1.
238. Thomson J.J. Proc. Cambridge Phil. Soc. 1901, 11:120.
239. Fuchs K. Proc. Cambridge Phil. Soc. 1938, 34:100.
240. Sondheimer E.H. Advan. Phys. 1951, 1:1.
241. Maissel L.I. Handbook of Thin Film Technology 1970, 13-21. McGraw-Hill, New York. L.I. Maissel, R. Glang (Eds.).
242. Angadi M.A. J. Mat. Sci. 1985, 20:761.
243. Mayadas A.F., Shatzkes M. Phys. Rev. 1970, B1:1382.
244. Sambles J.R. Thin Solid Films 1983, 106:321.
245. Hensel J.C., Tung R.T., Poate J.M., Unterwald F.C. Phys. Rev. Lett. 1985, 54:1840.
246. Maissel L.I. Handbook of Thin Film Technology 1970, 18-23. McGraw-Hill, New York. L.I. Maissel, R. Glang (Eds.).
247. Abeles B. Applied Solid State Science 1976, Vol. 6. Academic Press, New York. R. Wolfe (Ed.).
248. Pollack S.R., Seitchik J.A. Applied Solid State Science 1969, Vol. 1. Academic Press, New York. R. Wolfe (Ed.).
249. Jonscher A.K., Hill R.M. Physics of Thin Films 1975, Vol. 8. Academic Press, New York. M.H. Francombe, R.W. Hoffman (Eds.).
250. Simmons J.G. Handbook of Thin Film Technology 1970, McGraw-Hill, New York. L.I. Maissel, R. Glang (Eds.).
251. McGill T.C. J. Vac. Sci. Tech. 1974, 11:935.
252. Sze S.M. Semiconductor Devices-Physics and Technology 1985, Wiley, New York.
253. Streetman B.G. Solid State Electronic Devices 1980, Prentice-Hall, Englewood Cliffs, NJ. 2nd ed.
254. Wolters D.R., van der Schoot J.J. Philips J. Res. 1985, 40:115-136. 137-163, 164-192.
255. DiStefano T.H., Shatzkes M. Appl. Phys. Lett. 1974, 25:685.
256. A. M-R Lin, AT&T Bell Laboratories, private communication.
257. Williams J.E.C. Superconductivity and Its Applications 1970, Pion Limited, London.
258. Hughes D.D. Treatise on Materials Science and Technology 1979, Vol. 14. Academic Press, New York. T. Luhman, D.D. Hughes (Eds.).
259. Bardeen J., Cooper L.N., Schrieffer J.R. Phys. Rev. 1957, 108:1175.
260. Josephson B.D. Rev. Mod. Phys. 1964, 36:216.
261. Chopra K.I. Thin Film Phenomena 1969, McGraw-Hill, New York.
262. Middelhoek S. Magnetic Properties of Materials 1971, McGraw-Hill, New York. J. Smit (Ed.).
263. Howard J.K. J. Vac. Sci. Tech. 1986, A4:1.
264. Arnoldussen T.C. Proc. IEEE 1986, 74:1528.
265. Meiklejohn W.H. Proc. IEEE 1986, 74:1570.
266. Doring W. Z. Naturf. 1961, 16a:1146.
267. Bayreuther G. J. Mag. Mag. Mat. 1983, 38:273.
268. Pierce D.T., Celotta R.J., Urguris J., Siegman H.C. Phys. Rev. 1982, B26:2566.
269. Pugh E.W. 1963, Academic Press, New York. G. Hass (Ed.).
270. Bobeck A.H., Della Torre E. Magnetic Bubbles 1975, North-Holland, Amsterdam.
271. Stoner E.C., Wohlfarth E.P. Phil. Trans. Roy. Soc. (London) 1948, A240:599.
272. Giess E.A. Science 1980, 208:938.
273. Rose D.K., Silverman P.J., Washburn H.A. VLSI Electronics: Microstructure Science 1982, Vol. 4. Academic Press, New York. N.G. Einspruch (Ed.).
274. Macleod H.A. Applied Optics and Optical Engineering 1987, Vol. X. Academic Press, New York. R.R. Shannon, J.C. Wyant (Eds.).
275. Heavens O.S. Optical Properties of Thin Solid Films 1965, Dover, New York.
276. Anders H. Thin Films in Optics 1967, Focal Press, London.
277. Chopra K.I. Thin Film Phenomena 1969, McGraw-Hill, New York.
278. Pulker H.K. Coatings on Glass 1984, Elsevier, Amsterdam.
279. Macleod H.A. Thin-Film Optical Filters 1987, Adam Hilger, London and Macmillan, New York.
280. Hass G., Heaney J.B., Hunter W.R. Physics of Thin Films 1982, Vol. 12. Academic Press, New York. G. Hass, M.H. Francombe, J.L. Vossen (Eds.).
281. Hass G., Ritter E. J. Vac. Sci. Tech. 1967, 4:71.
282. Kittel C. Introduction to Solid State Physics 1971, Wiley, New York. 4th ed.
283. Mott N.F., Jones H. The Theory and Properties of Metals and Alloys 1936, Clarendon Press, Oxford.
284. Köstlin H., Frank G. Philips Tech. Rev. 1983/4, 41:225.
285. Vossen J.L. Physics of Thin Films 1977, Vol. 9. Academic Press, New York. G. Hass, M.H. Francombe, R.W. Hoffman (Eds.).
286. Harris M., Macleod H.A., Ogura S., Pelletier E., Vidal B. Thin Solid Films 1979, 57:173.
287. Martin P.J. J. Mater. Sci. 1986, 21:1.
288. Hass G., Waylonis M. J. Opt. Soc. Am. 1961, 51:719. G. Hass, Optik 1, 8 (1946).
289. Olsen G.L., Roth J.A. Mat. Sci. Repts. 1988, 3:1.
290. Lissberger P.H. Rep. Prog. Phys. 1970, 33:197.
291. Penselin S., Steudel A. Z. Phys. 1955, 142:21.
292. The Optical Industry and Systems Purchasing Directory-Encyclopdia (1979).
293. Ashby M.F., Jones D.R.H. Engineering Materials 1 and 2 1980 and 1986, Pergamon Press, Oxford.
294. Almond E.A. Vacuum 1984, 34:835.
295. Holleck H. J. Vac. Sci. Tech. 1986, A4:2661.
296. Sundgren J.E., Hentzell H.T.G. J. Vac. Sci. Tech. A 1986, 4:2259.
297. Rühle M. J. Vac. Sci. Tech. 1985, A3:749.
298. Kramer B.M., Judd P.K. J. Vac. Sci. Tech. 1985, A3:2439.
299. Deposition Technologies For Films and Coatings 1982, Noyes, Park Ridge, NJ. R.F. Bunshah (Ed.).
300. Quinto D.T., Wolfe G.J., Jindal P.C. Thin Solid Films 1987, 153:19.
301. Bunshah R.F., Deshpandey C. Physics of Thin Films 1987, Vol. 13. Academic Press, New York. M.H. Francombe, J.L. Vossen (Eds.).
302. Holleck D., Schulz H. Thin Solid Films 1987, 153:11.
303. Layyous A., Wertheim R. J. de Phys. Collogue 1989, C5:423.
304. Sproul W.D. Thin Solid Films 1983, 107:141.
305. Brookes C.A. Science of Hard Materials 1983, Plenum Press, New York.
306. Münz W.D., Hessberger G. Vak. Tech. 1981, 30:78.
307. Gille G. Thin Solid Films 1984, 11:201.
308. Mehrotra P.K., Quinto D.T. J. Vac. Sci. Tech. 1985, A3:2401.
309. Hailing J. Thin Solid Films 1983, 108:103.
310. Antler M. Thin Solid Films 1981, 84:245.
311. Rabinowicz E. Lubr. Eng. 1977, 33:378.
312. Buhl R., Pulker H.K., Moll E. Thin Solid Films 1981, 80:265.
313. Tucker R.C. Metals Handbook 1986, Vol. 11. American Society for Metals. 9th ed.
314. Hillery R.V. J. Vac. Sci. Tech. 1986, A4:2624.
315. Boving H.J., Hintermann H.E. Thin Solid Films 1987, 153:253.
316. Hintermann H.E. Thin Solid Films 1981, 84:215.
317. S. Mrowec and T. Werber, Gas Corrosion of Metals U.S. Dept. of Commerce, NTIS TT 76-54038, Springfield, VA (1978).
318. Stecura S. Thin Solid Films 1986, 136:241.
319. Miller R.A., Berndt C.C. Thin Solid Films 1984, 119:195.
320. Johner G., Schweitzer K.K. Thin Solid Films 1984, 119:301.
321. Yariv A. Optical Electronics 1985, Holt, Rhinehart and Winston, New York. 3rd ed.
322. Draper C.W., Poate J.M. Int. Met. Rev. 1985, 30:85.
323. Bloembergen N. Laser-Solid Interactions and Laser Processing 1979, Amer. Inst, of Physics, No. 50. S.D. Ferris, H.J. Leamy, J.M. Poate (Eds.).
324. Bell A.E. RCA Rev. 1979, 40:295.
325. Greenwald L.E., Breinan E.M., Kear B.H. Laser-Solid Interactions and Laser Processing 1979, Amer. Inst, of Physics, No. 50. S.D. Ferris, H.J. Leamy, J.M. Poate (Eds.).
326. Hsu S.C., Chakravorty S., Mehrabian R. Metall. Trans. 1978, 9B:221.
327. Rimini E. Surface Modification and Alloying 1983, Plenum Press, New York. J.M. Poate, G. Foti, D. Jacobson (Eds.).
328. Baeri P., Campisano S.U. Laser Annealing of Semiconductors 1982, Academic Press, New York. J.M. Poate, J.W. Mayer (Eds.).
329. Williams J.S. Surface Modification and Alloying 1983, Plenum Press, New York. J.M. Poate, G. Foti, D.C. Jacobson (Eds.).
330. Baeri P., Foti G., Poate J.M., Campisano S.U., Cullis A.G. Appl. Phys. Lett. 1981, 38:800.
331. D. C. Jacobson, Ph.D. Thesis, Stevens Institute of Technology, Hoboken, NJ (1988).
332. Jackson K.A. Surface Modification and Alloying 1983, Plenum Press, New York. J.M. Poate, G. Foti, D.C. Jacobson (Eds.).
333. Hirvonen J.K. Ion Implantation, Treatise on Materials Science and Technology 1980, Vol. 18. Academic Press, New York.
334. Lindhard J., Scharff M., Schiott H.E. Kgl. Danske. Vid. Selsk. Mat. Fys. Medd. 1963, 33(14):1.
335. Davies J.A. Surface Modification and Alloying 1983, Plenum Press, New York. J.M. Poate, G. Foti, D.C. Jacobson (Eds.).
336. Dienes C.J., Vineyard G.H. Radiation Effects in Solids 1957, Wiley-Interscience, New York.
337. Brown W.L. Beam Solid Interactions and Phase Transformations 1986, Mat. Res. Soc, Pittsburgh. H. Kurz, G.L. Olsen, J.M. Poate (Eds.).
338. Burenkov A.F., Komarov F.F., Kumakhov M.A., Temkin M.M. Tables of Ion Implantation Spatial Distributions 1986, Gordon and Breach, New York.
339. Seidel T.E. VLSI Technology 1983, McGraw-Hill, New York. S.M. Sze (Ed.).
340. Brodie I., Muray J.J. The Physics of Microfabrication 1982, Plenum Press, New York.
341. Agarwal S.B., Yang Y.F., Clayton C.R., Herman H., Hirvonen J.K. Thin Solid Films 1979, 63:19.
342. Mayer J.W., Lau S.S. Surface Modification and Alloying 1983, Plenum Press, New York. J.M. Poate, G. Foti, D. Jacobson (Eds.).
343. Feldman L.C., Mayer J.W. Fundamentals of Surface and Thin-Film Analysis 1986, North-Holland, New York.
344. Hirvonen J.K., Clayton C.R. Surface Modification and Alloying 1983, Plenum Press, New York. J.M. Poate, G. Foti, D. Jacobson (Eds.).
345. Wehner G.K. J. Vac. Sci. Tech. 1985, A3:1821.
346. Auciello P., Kelly R. Ion Bombardment Modification of Surfaces - Fundamentals and Applications 1984, Elsevier, Amsterdam.
347. Whitton J.L., Carter G., Nobes M.J. Radiation Effects 1977, 32:129.
348. Celler G.K. Solid State Technology 1987, 30(3):69.
349. White A.E., Short K.T. Science 1988, 241(8):930.
350. Hess D.W. Microelectronic Materials and Processes 1989, Kluwer Academic, Dordrecht. R.A. Levy (Ed.).
351. Wolf S., Tauber R.N. Silicon Processing for the VLSI Era 1986, Lattice Press, Sunset Beach, Calif.
352. Taylor G.N. Microelectronic Materials and Processes 1989, Kluwer Academic, Dordrecht. R.A. Levy (Ed.).
353. Brodie I., A Muray J. The Physics of Microfabrication 1982, Plenum Press, New York.
354. Angeli J.B., Terry S.C., Barth P.W. Scientific American 1983, 248:44.
355. Mehregany M., Gabriel K.J., Trimmer W.S.N. IEEE Trans. Elee. Dev. 1988, 35:719.
356. Skidmore K. Semiconductor Int. 1988, 11(9):15.
357. Tai W.W. Silicon Micromachining 1989, Stevens Institute of Technology, Hoboken, NJ, M. S. Thesis.
358. von Bolton W. Z. Electrochem 1911, 17:971.
359. Bridgeman P.D. Scientific American 1975, 233:102.
360. Derjaguin B.V., Fedeseev D.V. Scientific American 1975, 233:102.
361. DeVries R.C. Ann. Rev. Mater. Sci. 1987, 17:161.
362. Tsai H.-C., Bogy D.B. J. Vac. Sci. Tech. 1987, A5:3287.
363. Dimos D., Clarke D.R. Surfaces and Interfaces of Ceramic Materials 1989, Kluwer Academic, Dordrecht. L.C. Dufour, C. Monty, G.P. Ervas (Eds.).
364. Tarascon J.M., Bagley B.G. MRS Bull. 1989, XIV(1):53.
365. Simon R. Solid State Tech. 1989, 32(9):141.
366. Howard J.K. J. Vac. Sci. Tech. 1986, 4A:1.
367. Arnoldussen T.C., Rossi E.M. Ann. Rev. Mater. Sci. 1985, 15:379.
368. Bertram H.N. Proc. IEEE 1986, 74:1494.
369. Arnoldussen T.C. Proc. IEEE 1986, 74:1526.
370. Isailovic J. Videodisc and Optical Memory Systems 1985, Prentice-Hall, Englewood Cliffs, NJ.
371. Bell A.E. Handbook of Laser Science and Technology 1987, Vol. V. CRC Press, Boca Raton. M.J. Weber (Ed.).
372. Hartmann M., Jacobs B.A.J., Breat J.J.M. Philips Tech. Rev. 1985, 42:37.
373. Kryder M.H. J. Appl. Phys. 1985, 57:3913.
374. Gau J.S. Mat. Sci. Eng. 1989, B3:371.
375. Meiklejohn W.H. Proc. IEEE 1986, 74:1570.
376. Gravesteijn D.J., van der Poel C.J., Scholte P.M.L.O., van Uijen C.M.J. Philips Tech. Rev. 1989, 44:250.
377. Hunsperger R.G. Integrated Optics: Theory and Technology 1984, Springer-Verlag, Berlin.
378. Conwell E.M., Burnham R.D. Ann. Rev. Mater. Sci. 1978, 8:135.
379. Alferness R.C. IEEE J. Quantum Electro. 1981, QE 17:946.
380. Miller S.E. Bell Syst. Tech. J. 1969, 48:2059.
381. Chartier C. Integrated Optics, Physics and Applications 1983, Plenum Press, New York. S. Martellucci, A.N. Chester (Eds.).
382. Suhara T., Nishihara H. IEEE J. Quantum Dev. 1986, QE-22:845.
383. Esaki L., Tsu R. IBM J. Res. Dev. 1970, 14:61.
384. Esaki L. Symposium on Recent Topics in Semiconductor Physics 1982, World Scientific. H. Kamimura, Y. Toyozawa (Eds.).
385. Eppenga R.E., Schuurmans M.F.H. Philips Tech. Rev. 1988, 44:137.
386. Dingle R., Wiegmann W., Henry C. Phys. Rev. Lett. 1974, 33:827.
387. Kopf R.F. Ph.D. Thesis 1991, Stevens Institute of Technology, Hoboken, New Jersey.
388. Schuller I.K. Physics, Fabrication and Applications of Multilayered Structures 1988, Plenum Press, New York. P. Ghez, C. Weisbuch (Eds.).
389. Capasso F. Science 1987, 235:172.
390. Capasso F., Datta S. Physics Today 1990, 43(2):74.
391. Howard R.E., Skocpol W.J., Jackel L.D. Ann. Rev. Mater. Sci. 1986, 16:441.
392. Smith H.I., Craighead H.G. Physics Today 1990, 43(2):24.
393. Clarke J. Nature 1988, 333(5):29.
394. Wolsky A.M., Giese R.F., Daniels E.J. Scientific American 1989, 260:61.
395. Silver A.H. IEEE Trans. Magnetics 1979, 15(1):268.
396. Clarke J., Koch R.H. Science 1988, 242:217.
397. Dössel O., Kuhn M.H., Weiss H. Philips Tech. Rev. 1989, 44:259.
398. Matisoo J. Scientific American 1980, 242(5):50.
399. Anacker W. IEEE Spectrum 1979, 16(5):26.
400. Laibowitz R.B., Koch R.H., Gupta A., Koren G., Gallagher W.J., Foglietti V., Oh B., Viggiano J.M. Appl. Phys. Lett. 1990, 56:686.
401. Chopra K.L., Kaur I. Thin Film Device Applications 1983, Plenum Press, New York.