Morphological and structural analysis of nano-structured gold thin film on silicon by pulsed laser deposition technique

Vacuum

Volumn 85, Issue 3, 2010, Pages 353-357

  Khaleeq Ur Rahman, M ^a   Bhatti, K A ^a   Rafique, M S ^a   Anjum, S ^a   Latif, A ^a   Anjum, M ^a   Ahsan, A ^a   Ozair, H ^a  

^a UNIVERSITY OF ENGINEERING AND TECHNOLOGY   (Pakistan)

Author keywords

Au; Nanostructures; Nd: YAG; Pulsed laser deposition; Vacuum

Indexed keywords

AU; AVERAGE SIZE; CCD IMAGES; DEPOSITED FILMS; DISLOCATION LINES; GOLD THIN FILMS; NANO-STRUCTURED; ND: YAG; NONUNIFORM; P-TYPE; PLD TECHNIQUE; PULSED LASER; PULSED-LASER DEPOSITION TECHNIQUE; ROOM TEMPERATURE; SEM; XRD;

DEPOSITION; DISLOCATIONS (CRYSTALS); GOLD; GOLD COATINGS; GOLD DEPOSITS; NANOSTRUCTURES; NEODYMIUM; NEODYMIUM LASERS; OPTIMIZATION; PULSED LASER DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SINGLE CRYSTALS; STRUCTURAL ANALYSIS; THIN FILMS; VACUUM; VAPOR DEPOSITION;

PULSED LASERS;

EID: 77957749829     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.05.002     Document Type: Article

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