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Thin Solid Films

Volumn 519, Issue 1, 2010, Pages 164-168

Chemical states of carbon in amorphous boron carbide thin films deposited by radio frequency magnetron sputtering

(2) Bao, Ruqiang a Chrisey, Douglas B a

a RENSSELAER POLYTECHNIC INSTITUTE (United States)

Author keywords

Boron carbide; Chemical state; RF magnetron sputtering; X ray photoelectron spectroscopy

Indexed keywords

AMORPHOUS BORON; C-MODELS; CARBON ATOMS; CARBON FORMS; CHEMICAL STATE; CORE LEVELS; RADIO FREQUENCY MAGNETRON SPUTTERING; RAMAN MAPPING; RF-MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURE; TWO-STATE; XPS;

AMORPHOUS CARBON; AMORPHOUS FILMS; BORON; CARBON FILMS; ELECTRONS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MAGNETRON SPUTTERING; PHOTOELECTRICITY; PHOTONS; RADIO BROADCASTING; RADIO TRANSMISSION; RADIO WAVES; RAMAN SCATTERING; RAMAN SPECTROSCOPY; THIN FILMS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

BORON CARBIDE;

EID: 77957696175 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.07.090 Document Type: Article

Times cited : (34)

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