In situ probing of fast defect annealing in Cu and Ni with a high-intensity positron beam

Physical Review Letters

Volumn 105, Issue 14, 2010, Pages

  Oberdorfer, Bernd ^a   Steyskal, Eva Maria ^a   Sprengel, Wolfgang ^a   Puff, Werner ^a   Pikart, Philip ^b   Hugenschmidt, Christoph ^b   Zehetbauer, Michael ^c   Pippan, Reinhard ^d   Würschum, Roland ^a  

^a GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^c UNIVERSITY OF VIENNA   (Austria)

^d UNIVERSITY OF LEOBEN   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECT ANNEALING; HIGH-PRECISION; IN-SITU MONITORING; IN-SITU PROBING; POSITRON BEAMS; POSITRON-ELECTRON ANNIHILATION; THERMAL CONDITION; THERMALLY ACTIVATED; TIME-SCALES;

ANNEALING; DEFECTS; ELECTRONS; PARTICLE BEAMS; POSITRONS;

GRAIN GROWTH;

EID: 77957577030     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.105.146101     Document Type: Article

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