Effects of film density on electrochromic tungsten oxide thin films deposited by reactive dc-pulsed magnetron sputtering

Journal of Alloys and Compounds

Volumn 504, Issue SUPPL. 1, 2010, Pages

  Sun, Xilian ^a   Liu, Zhimin ^a   Cao, Hongtao ^a  

^a NINGBO INSTITUTE OF MATERIALS TECHNOLOGY AND ENGINEERING   (China)

Author keywords

Electrochromic; Film density; Reactive sputtering; Tungsten oxide film

Indexed keywords

COLORATION EFFICIENCIES; ELECTROCHROMIC PERFORMANCE; ELECTROCHROMICS; FILM DENSITY; LOWER DENSITY; MAXIMUM VALUES; OPTICAL MODULATION; POROUS FILM; PULSED MAGNETRON SPUTTERING; SPECTROSCOPIC ELLIPSOMETERS; SPUTTERED FILMS; TEM; TUNGSTEN OXIDE; TUNGSTEN OXIDE FILM; TUNGSTEN OXIDE THIN FILMS; WORKING PRESSURES;

AMORPHOUS FILMS; ELECTROCHROMISM; ORGANIC POLYMERS; OXIDES; REFRACTIVE INDEX; SURFACE ROUGHNESS; THIN FILMS; TUNGSTEN; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION;

OXIDE FILMS;

EID: 77957568474     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2010.03.155     Document Type: Article

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