Chemical solution deposition of CaCu3Ti4O 12 thin film

Bulletin of Materials Science

Volumn 33, Issue 3, 2010, Pages 203-207

  Saji, Viswanathan S ^a   Choe, Han Cheol ^a  

^a Chosun University   (South Korea)

Author keywords

CaCu3Ti4O12; Chemical solution deposition; Dielectric properties; Thin film

Indexed keywords

BIMODAL SIZE DISTRIBUTION; BORON-DOPED; CACU3TI4O12; CHEMICAL SOLUTION DEPOSITION; DEPOSITED FILMS; DIELECTRIC CONSTANTS; IMPEDANCE SPECTROSCOPY; LOSS FACTOR; POLYCRYSTALLINE; PREFERENTIAL ORIENTATION; ROOM TEMPERATURE; SILICA SUBSTRATE; SINTERING TEMPERATURES; X RAY DIFFRACTOMETRY;

BORON; CHEMICALS; DIELECTRIC PROPERTIES; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SCANNING ELECTRON MICROSCOPY; SILICA; SINTERING; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS;

DEPOSITION;

EID: 77957551525     PISSN: 02504707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12034-010-0031-y     Document Type: Article

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