Directed assembly of cylinder-forming ternary blend of block copolymer and their respective homopolymers on chemical patterns with density multiplication of features

Journal of Photopolymer Science and Technology

Volumn 23, Issue 2, 2010, Pages 297-299

  Kang, Huiman ^a   Stuen, Karl O ^a   Nealey, Paul F ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

Blending homopolymer; Block copolymer; Device oriented pattern; Nanostructure

Indexed keywords

EID: 77957078349     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.23.297     Document Type: Article

References (8)

1. S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, P. F. Nealey, "Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates", Nature 424(6947) 411-414 (2003).
2. M. P. Stoykovich, P. F. Nealey, "Block copolymers and conventional lithography", Materials Today 9(9) 20-29 (2006).
3. E. W. Edwards, M. F. Montague, H. H. Solak, C. J. Hawker, P. F. Nealey, "Precise control over molecular dimensions of block-copolymer domains using the interfacial energy of chemically nanopatterned substrates", Advanced Materials 16(15) 1315-+ (2004).
4. E. W. Edwards, M. Muller, M. P. Stoykovich, H. H. Solak, J. J. de Pablo, P. F. Nealey, "Dimensions and shapes of block copolymer domains assembled on lithographically defined chemically patterned substrates", Macromolecules 40(1) 90-96 (2007).
5. R. Ruiz, H. M. Kang, F. A. Detcheverry, E. Dobisz, D. S. Kercher, T. R. Albrecht, J. J. de Pablo, P. F. Nealey, "Density multiplication and improved lithography by directed block copolymer assembly", Science 321(5891) 936-939 (2008).
6. M. P. Stoykovich, M. Muller, S. O. Kim, H. H. Solak, E. W. Edwards, J. J. de Pablo, P. F. Nealey, "Directed assembly of block copolymer blends into nonregular device-oriented structures", Science 308(5727) 1442-1446 (2005).
7. H. Kang, G. S. W. Craig, P. F. Nealey, "Directed assembly of asymmetric ternary block copolymer-homopolymer blends using symmetric block copolymer into checkerboard trimming chemical pattern", Journal of Vacuum Science & Technology B 26(6) 2495-2499 (2008).
8. H. Kang, E. Han, P. Gopalan, P. F. Nealey, "Defect Control and Improving Uniformity of Assembled Nanostructures for Density Multiplication of Cylinder-Forming Block Copolymer Thin Films", (in preparation).