SCOPUS 정보 검색 플랫폼

Radiation Effects and Defects in Solids

Volumn 165, Issue 6-10, 2010, Pages 534-542

Surface ion implantation induced by laser-generated plasmas

(5) Giuffrida, L a,b Torrisi, L a,b Gammino, S b Wolowski, J c Ullschmied, J d

a UNIVERSITY OF MESSINA (Italy)

b INFN LABORATORI NAZIONALI DEL SUD (Italy)

c SOLTAN INSTITUTE FOR NUCLEAR STUDIES (Poland)

d INSTITUTE OF PLASMA PHYSICS (Czech Republic)

Author keywords

Ion implantation; Laser ablation; Laser plasma; RBS analysis

Indexed keywords

CHARGE STATE; DEPTH PROFILE; DIFFERENT SUBSTRATES; ENERGETIC ION; EXPERIMENTAL CONDITIONS; HIGH DOSE; IMPLANTED LAYERS; IN-VACUUM; ION DOSE; ION ENERGIES; ION ENERGY ANALYZER; LASER FACILITIES; LASER PLASMA; LASER SHOTS; LASER-GENERATED PLASMA; ON-LINE MEASUREMENT; PHYSICAL AND CHEMICAL PROPERTIES; RBS ANALYSIS; SOLID TARGETS; SUBSTRATE SURFACE; TARGET SURFACE;

CHEMICAL PROPERTIES; GERMANIUM; ION IMPLANTATION; LASER ABLATION; LASER BEAMS; LASER PRODUCED PLASMAS; PLASMA DIAGNOSTICS; PLASMA INTERACTIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES; TANTALUM;

PULSED LASER APPLICATIONS;

EID: 77957005640 PISSN: 10420150 EISSN: 10294953 Source Type: Journal
DOI: 10.1080/10420151003722560 Document Type: Conference Paper

Times cited : (9)

References (10)

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