Ion implantation induced by Cu ablation at high laser fluence

Applied Surface Science

Volumn 252, Issue 24, 2006, Pages 8533-8538

  Torrisi, L ^a,b   Mezzasalma, A M ^a   Gammino, S ^b   Badziak, J ^c   Parys, P ^c   Wolowski, J ^c   Laska, L ^d   Franco, G ^e  

^a UNIVERSITY OF MESSINA   (Italy)

^b INFN LABORATORI NAZIONALI DEL SUD   (Italy)

^c SOLTAN INSTITUTE FOR NUCLEAR STUDIES   (Poland)

^d INSTITUTE OF PHYSICS   (Czech Republic)

^e STMICROELECTRONICS   (Italy)

Author keywords

AES analysis; Ion implantation; Laser ablation; Plasma laser; RBS analysis

Indexed keywords

ELECTRIC CHARGE; ELECTROSTATICS; IODINE; ION IMPLANTATION; LASER ABLATION; SILICON;

BOLTZMANN ENERGY DISTRIBUTIONS; ION ENERGY ANALYZER (IEA); PRAGUE ASTERIX LASER SYSTEM (PALS);

COPPER;

EID: 33749153210     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.11.071     Document Type: Article

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