Ge laser-generated plasma for ion implantation

Radiation Effects and Defects in Solids

Volumn 163, Issue 4-6, 2008, Pages 401-409

  Giuffrida, L ^a   Torrisi, L ^b,c   Czarnecka, A ^d   Wolowski J ^d   Quarta, G ^e   Calcagnile, L ^e   Lorusso, A ^e   Nassisi, V ^e  

^a UNIVERSITY OF CATANIA   (Italy)

^b UNIVERSITY OF MESSINA   (Italy)

^c INFN SEZIONE DI CATANIA   (Italy)

^d SOLTAN INSTITUTE FOR NUCLEAR STUDIES   (Poland)

^e UNIVERSITY OF SALENTO   (Italy)

Author keywords

Ion implantation; Laser ablation; Laser plasma; RBS analysis

Indexed keywords

AIR POLLUTION; CHEMICAL LASERS; CHEMICAL VAPOR DEPOSITION; EXCIMER LASERS; GAS LASERS; GERMANIUM; HELIUM; INERT GASES; IODINE; ION BEAM ASSISTED DEPOSITION; ION BOMBARDMENT; ION IMPLANTATION; LASERS; NEODYMIUM; PLASMA DIAGNOSTICS; PLASMAS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; THICK FILMS;

ACCELERATION EFFECTS; EXCIMER; HELIUM BEAMS; IMPLANTATION DOSES; IN-VACUUM; IODINE LASERS; ION COLLECTORS; ION ENERGIES; ION ENERGY ANALYZERS; LASER ABLATION; LASER SOURCES; LASER-PLASMA; ND: YAG; RBS ANALYSIS; RUTHERFORD BACKSCATTERING SPECTROMETRY; TARGET SURFACES; THIN-FILM DEPOSITIONS; TIME -OF-FLIGHT;

IONS;

EID: 49449085277     PISSN: 10420150     EISSN: 10294953     Source Type: Journal    
DOI: 10.1080/10420150701777900     Document Type: Article

References (8)

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