Characterization of reactive sputtered ITO and TiO2/ITO thin films for applications at elevated temperatures

ISSE 2010 - 33rd International Spring Seminar on Electronics Technology: Polymer Electronics and Nanotechnologies: Towards System Integration - Conference Proceedings

Volumn , Issue , 2010, Pages 65-70

  Boyadzhiev, Stefan I ^a   Rassovska, Milka M ^a   Matsumura, Yoshihito ^b   Kotani, Yuta ^b   Yordanov, Rumen S ^a   Yordanova, Irena R ^a  

^a TECHNICAL UNIVERSITY OF SOFIA   (Bulgaria)

^b TOKAI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERISATION; DIFFERENT SUBSTRATES; ELEVATED TEMPERATURE; EPMA; FTIR SPECTROPHOTOMETERS; GAS SENSORS; HEAT REFLECTIVE COATINGS; HIGH RESOLUTION; INDIUM TIN OXIDE; ITO THIN FILMS; LASER ELLIPSOMETRY; MAGNETRON REACTIVE SPUTTERING; OPTIMAL PROPERTIES; POST DEPOSITION ANNEALING; PROFILE ANALYSIS; RADIO FREQUENCIES; REACTIVE GAS; SEM; STRUCTURE CHANGE; TARGET COMPOSITION; TECHNOLOGICAL PARAMETERS; THERMAL IR; TIO; UNDERLAYERS; XPS; XRD;

HEATING; INDIUM; MAGNETRONS; NANOTECHNOLOGY; OPTICAL PROPERTIES; OXIDE FILMS; OXYGEN; QUARTZ; REFLECTIVE COATINGS; SPECTROPHOTOMETRY; SUBSTRATES; TECHNICAL PRESENTATIONS; THIN FILMS; TIN; TIN OXIDES; TITANIUM; TITANIUM OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

ITO GLASS;

EID: 77956970663     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISSE.2010.5547262     Document Type: Conference Paper

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