Properties of MgTiO3 thin films prepared by RF magnetron sputtering for microwave application

Journal of Crystal Growth

Volumn 282, Issue 3-4, 2005, Pages 482-489

  Chen, Yuan Bin ^a   Huang, Cheng Liang ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

A1. X ray diffraction; A3. Thin film; B1. Titanium compounds

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; MAGNESIUM COMPOUNDS; MAGNETRON SPUTTERING; MICROWAVES; MIS DEVICES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; X RAY DIFFRACTION;

AFM; DIELECTRIC CHARACTERISTICS; POLYCRYSTALLINE MICROSTRUCTURE; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 23144444953     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.05.015     Document Type: Article

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