Etching processes of transparent carbon nanotube thin films using laser technologies

Thin Solid Films

Volumn 518, Issue 24, 2010, Pages 7253-7257

  Lin, H K ^a   Lin, R C ^a   Li, C H ^a  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

CNT; Etching; Flexible substrate; Laser

Indexed keywords

1064 NM LASERS; 355 NM UV LASER; CARBON NANOTUBE FILMS; CNT; CNT FILMS; ETCHING PROCESS; FLEXIBLE SUBSTRATE; LASER TECHNOLOGIES; MECHANICAL AND ELECTRICAL PROPERTIES; OPTIMAL CONDITIONS; THIN-FILM DEPOSITIONS; TRANSPARENT CONDUCTIVE MATERIALS;

ABLATION; CARBON FILMS; CONDUCTIVE MATERIALS; DEPOSITION; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; ETCHING; MECHANICAL PROPERTIES; SUBSTRATES; THIN FILMS;

CARBON NANOTUBES;

EID: 77956878930     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.04.094     Document Type: Conference Paper

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